Non-Fourier conduction model with thermal source term of ultra short high power pulsed laser ablation and temperature evolvement before melting

2005 ◽  
Vol 364 (1-4) ◽  
pp. 285-293 ◽  
Author(s):  
Duanming Zhang ◽  
Li Li ◽  
Zhihua Li ◽  
Li Guan ◽  
Xinyu Tan
Keyword(s):  
Laser Ablation ◽  
High Power ◽  
Source Term ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thermal Source ◽  
Conduction Model

A New Synthetical Model of High-Power Pulsed Laser Ablation

2007 ◽  
Vol 48 (1) ◽  
pp. 163-168 ◽  
Author(s):  
Zhang Duan-Ming ◽  
Fang Ran-Ran ◽  
Li Zhi-Hua ◽  
Guan Li ◽  
Li Li ◽  
...  
Keyword(s):  
Laser Ablation ◽  
High Power ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

scholarly journals Compact high-power optical source for resonant infrared pulsed laser ablation and deposition of polymer materials

2006 ◽  
Vol 14 (25) ◽  
pp. 12302 ◽  
Author(s):  
V. Z. Kolev ◽  
M. W. Duering ◽  
B. Luther-Davies ◽  
A. V. Rode
Keyword(s):  
Laser Ablation ◽  
High Power ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Polymer Materials ◽  
Optical Source

scholarly journals A Model of Ultra-Short Pulsed Laser Ablation of Metal with Considering Plasma Shielding and Non-Fourier Effect

Energies ◽  
2018 ◽  
Vol 11 (11) ◽  
pp. 3163 ◽  
Author(s):  
Sheng Tan ◽  
Jianjun Wu ◽  
Yu Zhang ◽  
Moge Wang ◽  
Yang Ou
Keyword(s):  
Laser Ablation ◽  
Plasma Plume ◽  
Great Influence ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Ablation Process ◽  
Conduction Model ◽  
Laser Ablation Process ◽  
Wide Range ◽  
Plasma Shielding

In this paper, a non-Fourier heat conduction model of ultra-short pulsed laser ablation of metal is established that takes into account the effect of the heat source, laser heating of the target, the evaporation and phase explosion of target material, the formation and expansion of the plasma plume, and interaction of the plasma plume with the incoming laser. Temperature dependent optical and thermophysical properties are also considered in the model due to the properties of the target will change over a wide range during the ultra-short pulsed laser ablation process. The results show that the plasma shielding has a great influence on the process of ultra-short pulsed laser ablation, especially at higher laser fluence. The non-Fourier effect has a great influence on the temperature characteristics and ablation depth of the target. The ultra-short pulsed laser ablation can effectively reduce the heat affected zone compared to nanosecond pulsed laser ablation. The comparison between the simulation results and the experimental results in the literature shows that the model with the plasma shielding and the non-Fourier effect can simulate the ultra-short pulsed laser ablation process better.

Improved thermal model and its application in UV high-power pulsed laser ablation of metal target

2008 ◽  
Vol 145 (11-12) ◽  
pp. 556-560 ◽  
Author(s):  
Ranran Fang ◽  
Duanming Zhang ◽  
Zhihua Li ◽  
Fengxia Yang ◽  
Li Li ◽  
...  
Keyword(s):  
Laser Ablation ◽  
High Power ◽  
Thermal Model ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Metal Target

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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