Patterned structures self-assembled from nanoparticle-polymer mixtures confined in square-pillar arrays

2018 ◽  
Vol 490 ◽  
pp. 565-572
Author(s):  
Ling Zhou ◽  
Zhizhong Tan ◽  
Ju Peng ◽  
Jinghuai Fang
1990 ◽  
Vol 93 (7) ◽  
pp. 5271-5280 ◽  
Author(s):  
Tomoaki Takebe ◽  
Kiyotoshi Fujioka ◽  
Ryuji Sawaoka

2002 ◽  
Vol 715 ◽  
Author(s):  
B. Yang ◽  
A.R. Woll ◽  
P. Rugheimer ◽  
M.G. Lagally

AbstractWe report spatial arrangement of self-assembled Ge quantum dots on patterned structures on Si (001) without using complicated lithography. Starting from stripes and mesas fabricated by conventional lithography and plasma etching, we prepare sinusoidal Si stripes with narrow ridges and mesas with humped edges via high-temperature annealing. Deposited Ge self-assembles into coherent nanocrystals that align along the narrow ridges of the stripes and the sloped mesa edges. Enhanced strain relief at the ridges due to elastic relaxation and the high step densities on the shallow slopes at the edges are likely causes of nanocrystal alignment.


2016 ◽  
Vol 12 (2) ◽  
pp. 224-232 ◽  
Author(s):  
Xingyu Zhu ◽  
Jiaping Lin ◽  
Chunhua Cai

1998 ◽  
Vol 95 (6) ◽  
pp. 1339-1342 ◽  
Author(s):  
R. Michalitsch ◽  
A. El Kassmi ◽  
P. Lang ◽  
A. Yassar ◽  
F. Garnier

Sign in / Sign up

Export Citation Format

Share Document