scholarly journals Plasma Monitoring during Laser Material Processing

2011 ◽  
Vol 12 ◽  
pp. 404-410 ◽  
Author(s):  
David Diego-Vallejo ◽  
David Ashkenasi ◽  
Gerd Illing ◽  
Hans Joachim Eichler
Measurement ◽  
2019 ◽  
Vol 135 ◽  
pp. 905-912 ◽  
Author(s):  
Yuan-Jen Chang ◽  
Chih-Yuan Wang ◽  
Jin-Chen Hsu ◽  
Chao-Ching Ho ◽  
Chia-Lung Kuo

Author(s):  
Ramin Sattari ◽  
Stephan Barcikowski ◽  
Thomas Püster ◽  
Andreas Ostendorf ◽  
Heinz Haferkamp

2014 ◽  
Vol 56 ◽  
pp. 421-428 ◽  
Author(s):  
I.O. Kovaleva ◽  
S.N. Grigoriev ◽  
A.V. Gusarov

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