Two 10 Gb/s directly modulated DBR lasers covering 20 nm wavelength range

2020 ◽  
Vol 475 ◽  
pp. 126236
Author(s):  
Daibing Zhou ◽  
Song Liang ◽  
Yiming He ◽  
Yunlong Liu ◽  
Dan Lu ◽  
...  
Keyword(s):  
Wavelength Range ◽  
Dbr Lasers ◽  
20 Nm

High performance continuously tunable top-emitting vertical cavity laser with 20 nm wavelength range

1997 ◽  
Vol 33 (12) ◽  
pp. 1051 ◽  
Author(s):  
M.Y. Li ◽  
W. Yuen ◽  
G.S. Li ◽  
C.J. Chang-Hasnain
Keyword(s):  
Wavelength Range ◽  
High Performance ◽  
Cavity Laser ◽  
20 Nm ◽  
Vertical Cavity

Advance in NPL X-Ray Gratings and Spectrometers

1975 ◽  
Vol 19 ◽  
pp. 571-575
Author(s):  
M. Stedman ◽  
A. Franks
Keyword(s):  
Wavelength Range ◽  
Short Wavelength ◽  
Grazing Incidence ◽  
Vitreous Silica ◽  
Holographic Grating ◽  
X Ray ◽  
First Order ◽  
Rectangular Profile ◽  
20 Nm

NPL x-ray gratings for use at grazing incidence in the wavelength range of 0.05 to 20 nm have diffraction efficiencies in the first order ranging from approximately 3% at 0.1 nm to 20% at wavelengths greater than 2 nm. X-ray gratings may have either a rectangular profile produced by processing a ruled or holographic grating or may have a shallow blazed waveform. In both types of grating, the grooves are formed in a vitreous silica blank and are usually overcoated with gold.A precision short wavelength (0.05 to 0.5 nm) Rowland circle focusing spectrometer has bee n constructed, which can cater for concave gratings of radii between 5 and 15 m.

scholarly journals The FERMI free-electron lasers

2015 ◽  
Vol 22 (3) ◽  
pp. 485-491 ◽  
Author(s):  
E. Allaria ◽  
L. Badano ◽  
S. Bassanese ◽  
F. Capotondi ◽  
D. Castronovo ◽  
...  
Keyword(s):  
Wavelength Range ◽  
Harmonic Generation ◽  
Free Electron ◽  
Free Electron Laser ◽  
High Gain ◽  
Free Electron Lasers ◽  
Operating Modes ◽  
20 Nm

FERMI is a seeded free-electron laser (FEL) facility located at the Elettra laboratory in Trieste, Italy, and is now in user operation with its first FEL line, FEL-1, covering the wavelength range between 100 and 20 nm. The second FEL line, FEL-2, a high-gain harmonic generation double-stage cascade covering the wavelength range 20–4 nm, has also completed commissioning and the first user call has been recently opened. An overview of the typical operating modes of the facility is presented.

scholarly journals MODEL OF TRANSMISSION OF MULTILAYER COATINGS BASED ON THE Cu-ZrO2 SYSTEM IN THE OPTICAL WAVELENGTH RANGE

Doklady BGUIR ◽  
2019 ◽  
pp. 87-94
Author(s):  
A. T. Volochko ◽  
V. A. Zelenin ◽  
E. O. Narushko ◽  
A. V. Skilandz ◽  
G. V. Markov
Keyword(s):  
Wavelength Range ◽  
Multilayer Coating ◽  
Transmission Model ◽  
Multilayer Coatings ◽  
Glass Substrates ◽  
Optical Wavelength ◽  
Light Interference ◽  
Number Of Layers ◽  
20 Nm ◽  
Zro2 System

The transmission model for optical diapason was developed for multilayer coatings consisting of alternating layers of copper and zirconium dioxide deposited on K8 glass substrates. The model is based on the laws of light interference. It was shown that the transmission in the optical range of a 60 nm thick Cu layer with a surface resistance ρ = 1 Ohm/sq is 4–5 %, and the transmission of the ZrO2/Cu/ZrO2/Cu/К8 coating obtained by dividing a 60 nm thick copper layer into two sublayers at 30 nm with the application of antireflection layers of ZrO2 on them, at ρ = 1.2 Ohm/sq it reaches 25 %. The thicknesses and the number of layers of the Cu-ZrO2 system were calculated, which ensure a transmission in the wavelength range of 400–700 nm of at least 45 %. The permissible thickness of Cu layers (≥ 20 nm) was determined, below which, due to their insular structure and partial oxidation with the formation of Cu2O, the electrical conductivity of the multilayer coating sharply decreases (ρ ≥ 100 Ohm/sq).  

Characterization of zone plate properties using monochromatic synchrotron radiation in the 2 to 20 nm wavelength range

2011 ◽  
Vol 50 (18) ◽  
pp. 3015 ◽  
Author(s):  
John Seely ◽  
Benjawan Kjornrattanawanich ◽  
Leonid Goray ◽  
Yan Feng ◽  
James Bremer
Keyword(s):  
Synchrotron Radiation ◽  
Wavelength Range ◽  
Zone Plate ◽  
20 Nm ◽  
Monochromatic Synchrotron

Macromolecular structures of biological specimens are not obscured by controlled osmium impregnation

1983 ◽  
Vol 41 ◽  
pp. 606-607
Author(s):  
Klaus-Ruediger Peters ◽  
Samuel A. Green
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Critical Point ◽  
Metal Films ◽  
High Magnification ◽  
Osmium Impregnation ◽  
Instrumental Resolution ◽  
20 Nm ◽  
Continuous Metal

High magnification imaging of macromolecules on metal coated biological specimens is limited only by wet preparation procedures since recently obtained instrumental resolution allows visualization of topographic structures as smal l as 1-2 nm. Details of such dimensions may be visualized if continuous metal films with a thickness of 2 nm or less are applied. Such thin films give sufficient contrast in TEM as well as in SEM (SE-I image mode). The requisite increase in electrical conductivity for SEM of biological specimens is achieved through the use of ligand mediated wet osmiuum impregnation of the specimen before critical point (CP) drying. A commonly used ligand is thiocarbohvdrazide (TCH), first introduced to TEM for en block staining of lipids and glvcomacromolecules with osmium black. Now TCH is also used for SEM. However, after ligand mediated osinification nonspecific osmium black precipitates were often found obscuring surface details with large diffuse aggregates or with dense particular deposits, 2-20 nm in size. Thus, only low magnification work was considered possible after TCH appl ication.

A scanning electron microscopic study of the veliger larvae of the scallop argopecten purpuratus

1988 ◽  
Vol 46 ◽  
pp. 284-285
Author(s):  
G.C. Bellolio ◽  
K.S. Lohrmann ◽  
E.M. Dupré
Keyword(s):  
Morphological Description ◽  
Electron Microscopic ◽  
Larval Stages ◽  
Scanning Electron Microscopic Study ◽  
The Pacific ◽  
Argopecten Purpuratus ◽  
Veliger Larvae ◽  
20 Nm ◽  
Ethanol Series ◽  
Scanning Electron

Argopecten purpuratus is a scallop distributed in the Pacific coast of Chile and Peru. Although this species is mass cultured in both countries there is no morphological description available of the development of this bivalve except for few characterizations of some larval stages described for culture purposes. In this work veliger larvae (app. 140 pm length) were examined by the scanning electron microscope (SEM) in order to study some aspects of the organogenesis of this species.Veliger larvae were obtained from hatchery cultures, relaxed with a solution of MgCl2 and killed by slow addition of 21 glutaraldehyde (GA) in seawater (SW). They were fixed in 2% GA in calcium free artificial SW (pH 8.3), rinsed 3 times in calcium free SW, and dehydrated in a graded ethanol series. The larvae were critical point dried and mounted on double scotch tape (DST). To permit internal view, some valves were removed by slightly pressing and lifting the tip of a cactus spine wrapped with DST, The samples were coated with 20 nm gold and examined with a JEOL JSM T-300 operated at 15 KV.

Analysis of 2D and 3D defects associated with precipitation of Cu in silicon

1991 ◽  
Vol 49 ◽  
pp. 870-871
Author(s):  
P.M. Rice ◽  
MJ. Kim ◽  
R.W. Carpenter
Keyword(s):  
Colony Growth ◽  
Dark Field ◽  
Dark Side ◽  
Silicide Phase ◽  
Strain Fields ◽  
Near Surface ◽  
Unknown Composition ◽  
Secondary Precipitates ◽  
20 Nm ◽  
2D And 3D

Extrinsic gettering of Cu on near-surface dislocations in Si has been the topic of recent investigation. It was shown that the Cu precipitated hetergeneously on dislocations as Cu silicide along with voids, and also with a secondary planar precipitate of unknown composition. Here we report the results of investigations of the sense of the strain fields about the large (~100 nm) silicide precipitates, and further analysis of the small (~10-20 nm) planar precipitates.Numerous dark field images were analyzed in accordance with Ashby and Brown's criteria for determining the sense of the strain fields about precipitates. While the situation is complicated by the presence of dislocations and secondary precipitates, micrographs like those shown in Fig. 1(a) and 1(b) tend to show anomalously wide strain fields with the dark side on the side of negative g, indicating the strain fields about the silicide precipitates are vacancy in nature. This is in conflict with information reported on the η'' phase (the Cu silicide phase presumed to precipitate within the bulk) whose interstitial strain field is considered responsible for the interstitial Si atoms which cause the bounding dislocation to expand during star colony growth.

Aspects of high-resolution imaging with a scanning ion microprobe

1986 ◽  
Vol 44 ◽  
pp. 750-751
Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang
Keyword(s):  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Chromatic Aberration ◽  
Ion Source ◽  
Ion Microprobe ◽  
Emission Pattern ◽  
Intrinsic Resolution ◽  
Resolution Imaging ◽  
20 Nm ◽  
Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

Ultramicrotomy as a Technique for Materials Specimen Preparation

1990 ◽  
Vol 48 (2) ◽  
pp. 428-429
Author(s):  
S.R. Glanvill
Keyword(s):  
Materials Science ◽  
Structural Information ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Cross Sectional ◽  
Surfaces And Interfaces ◽  
Beam Analysis ◽  
Flat Embedding ◽  
20 Nm ◽  
Sectional Analysis

This paper summarizes the application of ultramicrotomy as a specimen preparation technique for some of the Materials Science applications encountered over the past two years. Specimens 20 nm thick by hundreds of μm lateral dimension are readily prepared for electron beam analysis. Materials examined include metals, plastics, ceramics, superconductors, glassy carbons and semiconductors. We have obtain chemical and structural information from these materials using HRTEM, CBED, EDX and EELS analysis. This technique has enabled cross-sectional analysis of surfaces and interfaces of engineering materials and solid state electronic devices, as well as interdiffusion studies across adjacent layers.Samples are embedded in flat embedding moulds with Epon 812 epoxy resin / Methyl Nadic Anhydride mixture, using DY064 accelerator to promote the reaction. The embedded material is vacuum processed to remove trapped air bubbles, thereby improving the strength and sectioning qualities of the cured block. The resin mixture is cured at 60 °C for a period of 80 hr and left to equilibrate at room temperature.

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