Scatter considerations in ultra-high-resolution high-energy X-ray transmission imaging systems

2005 ◽  
Vol 538 (1-3) ◽  
pp. 747-755 ◽  
Author(s):  
Liebo Wang ◽  
Yinong Liu ◽  
Kejun Kang
Keyword(s):  
High Resolution ◽  
High Energy ◽  
Imaging Systems ◽  
X Ray ◽  
Transmission Imaging

High-resolution x-ray studies of an AXAF high-energy transmission grating

1994 ◽  
Author(s):  
Salim Abdali ◽  
Finn E. Christensen ◽  
Herbert W. Schnopper ◽  
Thomas H. Markert ◽  
Daniel Dewey ◽  
...  
Keyword(s):  
High Resolution ◽  
High Energy ◽  
Energy Transmission ◽  
X Ray ◽  
Transmission Grating

Oscillator strength study of the excitations of valence-shell of C2H2 by high-resolution inelastic x-ray scattering

2021 ◽  
Author(s):  
Qiang Sun ◽  
Ya-Wei Liu ◽  
Yuan-Chen Xu ◽  
Li-Han Wang ◽  
Tian-Jun Li ◽  
...  
Keyword(s):  
High Resolution ◽  
Theoretical Models ◽  
High Energy ◽  
Oscillator Strengths ◽  
Electron Collision ◽  
Valence Shell ◽  
X Ray ◽  
X Ray Scattering ◽  
Theoretical Results ◽  
Ray Scattering

Abstract The oscillator strengths of the valence-shell excitations of C2H2 are extremely important for testing theoretical models and studying interstellar gases. In this study, the high-resolution inelastic x-ray scattering (IXS) method is adopted to determine the generalized oscillator strengths (GOSs) of the valence-shell excitations of C2H2 at a photon energy of 10 keV. The GOSs are extrapolated to their zero limit to obtain the corresponding optical oscillator strengths (OOSs). Through taking a completely different experimental method of the IXS, the present results offer the high energy limit for electron collision to satisfy the first Born approximation (FBA) and cross-check the previous experimental and theoretical results independently. The comparisons indicate that an electron collision energy of 1500 eV is not enough for C2H2 to satisfy the FBA for the large squared momentum transfer, and the line saturation effect limits the accuracy of the OOSs measured by the photoabsorption method.

High energy high resolution monochromatic x‐ray computed tomography using the Photon Factory vertical wiggler beamline

1992 ◽  
Vol 63 (1) ◽  
pp. 615-618 ◽  
Author(s):  
Y. Nagata ◽  
H. Yamaji ◽  
K. Hayashi ◽  
K. Kawashima ◽  
K. Hyodo ◽  
...  
Keyword(s):  
Computed Tomography ◽  
High Resolution ◽  
High Energy ◽  
X Ray ◽  
Photon Factory ◽  
X Ray Computed

scholarly journals High-energy, high-resolution x-ray imaging for metallic cultural heritages

AIP Advances ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 105122
Author(s):  
Masato Hoshino ◽  
Kentaro Uesugi ◽  
Ryuji Shikaku ◽  
Naoto Yagi
Keyword(s):  
High Resolution ◽  
High Energy ◽  
X Ray ◽  
X Ray Imaging

Development of Real Time High Energy X-Ray Imaging System for Use in Dynamic Fluoroscopy of Aero Gas Turbines

1975 ◽  
Author(s):  
A. E. Stewart
Keyword(s):  
Real Time ◽  
Gas Turbines ◽  
Imaging System ◽  
High Energy ◽  
Cesium Iodide ◽  
Imaging Systems ◽  
X Ray ◽  
X Ray Imaging ◽  
Different Types

This paper discusses the development of a real-time high energy x-ray imaging system for use in dynamic fluoroscopy of aero gas turbines. In order to cover the range of subjects on gas turbines, over ten combinations of film and screen types are used. Three different types of x-ray imaging systems were considered for use: direct type intensifiers (cesium iodide phosphors), and indirect type intensifiers — Marconi “Marionette” and the Oude Delft “Delcalix.”

HAXPES beamline PES-BL14 at the Indus-2 synchrotron radiation source

2018 ◽  
Vol 25 (5) ◽  
pp. 1541-1547 ◽  
Author(s):  
Jagannath ◽  
U. K. Goutam ◽  
R. K. Sharma ◽  
J. Singh ◽  
K. Dutta ◽  
...  
Keyword(s):  
Thin Film ◽  
High Resolution ◽  
Electron Spectroscopy ◽  
High Energy ◽  
Solid Samples ◽  
Double Crystal ◽  
X Ray ◽  
Double Crystal Monochromator ◽  
Ccd Detector ◽  
Scientific Results

The Hard X-ray Photo-Electron Spectroscopy (HAXPES) beamline (PES-BL14), installed at the 1.5 T bending-magnet port at the Indian synchrotron (Indus-2), is now available to users. The beamline can be used for X-ray photo-emission electron spectroscopy measurements on solid samples. The PES beamline has an excitation energy range from 3 keV to 15 keV for increased bulk sensitivity. An in-house-developed double-crystal monochromator [Si (111)] and a platinum-coated X-ray mirror are used for the beam monochromatization and manipulation, respectively. This beamline is equipped with a high-energy (up to 15 keV) high-resolution (meV) hemispherical analyzer with a microchannel plate and CCD detector system with SpecsLab Prodigy and CasaXPS software. Additional user facilities include a thin-film laboratory for sample preparation and a workstation for on-site data processing. In this article, the design details of the beamline, other facilities and some recent scientific results are described.

Developments of X-Ray Grating Imaging Technology

2014 ◽  
Vol 898 ◽  
pp. 614-617
Author(s):  
Rui Hong Li ◽  
Yue Ping Han
Keyword(s):  
High Resolution ◽  
Imaging System ◽  
Imaging Techniques ◽  
Field Of View ◽  
Imaging Systems ◽  
Large Field ◽  
X Ray ◽  
X Ray Imaging ◽  
Angle Scattering ◽  
Interferometry Method

The present paper reviews the X-ray grating imaging systems at home and abroad from the aspects of technological characterizations and the newest researching focus. First, not only the imaging principles and the frameworks of the typical X-ray grating imaging system based on Talbot-Lau interferometry method, but also the algorithms of retrieving the signals of attenuation, refraction and small-angle scattering are introduced. Second, the system optimizing methods are discussed, which involves mainly the relaxing the requirement of high positioning resolution and strict circumstances for gratings and designing large field of view with high resolution. Third, two and four-dimensional grating-based X-ray imaging techniques are introduced.

scholarly journals Characterization of spatially resolved high resolution x-ray spectrometers for high energy density physics and light source experiments

2014 ◽  
Vol 85 (11) ◽  
pp. 11D612 ◽  
Author(s):  
K. W. Hill ◽  
M. Bitter ◽  
L. Delgado-Aparacio ◽  
P. Efthimion ◽  
N. A. Pablant ◽  
...  
Keyword(s):  
High Resolution ◽  
Energy Density ◽  
Light Source ◽  
High Energy ◽  
High Energy Density ◽  
X Ray ◽  
High Energy Density Physics ◽  
Spatially Resolved

Ion Implantation Defect Characterization by High-Resolution X-Ray Diffraction

1992 ◽  
Vol 262 ◽  
Author(s):  
Jos G.E. Klappe ◽  
István Bársony ◽  
Tom W. Ryan
Keyword(s):  
High Resolution ◽  
Ion Implantation ◽  
Lattice Strain ◽  
Crystalline Silicon ◽  
High Energy ◽  
Silicon Sample ◽  
Dislocation Loops ◽  
X Ray Diffraction ◽  
X Ray ◽  
Residual Defect

ABSTRACTHigh-energy ion-implantation is one of the roost critical processing steps regarding the formation of defects in mono-crystalline silicon. High- as well as low-doses implanted at various energies can result in relatively high residual defect concentrations after post-implantation annealing.Before annealing, the crystal lattice strain is mainly caused by the point defects. After annealing, the accommodation of substitutional impurities is the main origin of the residual lattice strain. High-Resolution X-ray Diffraction (HRXD) has been frequently used for the characterization of these structures. Dislocation loops formed during the high temperature step, however, cause enhanced diffuse X-ray scattering, which can dominate the measured X-ray intensity in conventional HRXD.Triple axis diffractometry is used in this study to analyze the size, type and location of defects in a boron implanted and rapid thermally annealed silicon sample.

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