A cryogenic set-up for low-frequency noise characterization of electronic devices

2004 ◽  
Vol 520 (1-3) ◽  
pp. 644-646 ◽  
Author(s):  
C Arnaboldi ◽  
G Boella ◽  
R Mazza ◽  
E Panzeri ◽  
G Pessina
Keyword(s):  
Electronic Devices ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Set Up ◽  
Noise Characterization

Using low-frequency noise characterization of AlGaN/GaN HEMT as a tool for technology assessment and failure prediction

2004 ◽  
Author(s):  
Jean-Guy Tartarin ◽  
Geoffroy Soubercaze-Pun ◽  
Abdelali Rennane ◽  
Laurent Bary ◽  
Robert Plana ◽  
...  
Keyword(s):  
Technology Assessment ◽  
Low Frequency ◽  
Failure Prediction ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Gan Hemt ◽  
Noise Characterization

Low-frequency noise characterization of n- and p-MOSFET's with ultrathin oxynitride gate films

1996 ◽  
Vol 17 (8) ◽  
pp. 395-397 ◽  
Author(s):  
P. Morfouli ◽  
G. Ghibaudo ◽  
T. Ouisse ◽  
E. Vogel ◽  
W. Hill ◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Noise Characterization

Low-Frequency Noise Characterization of Ultra-Low Equivalent-Oxide-Thickness Thulium Silicate Interfacial Layer nMOSFETs

2015 ◽  
Vol 36 (12) ◽  
pp. 1355-1358 ◽  
Author(s):  
Maryam Olyaei ◽  
Eugenio Dentoni Litta ◽  
Per-Erik Hellstrom ◽  
Mikael Ostling ◽  
Bengt Gunnar Malm
Keyword(s):  
Interfacial Layer ◽  
Low Frequency ◽  
Oxide Thickness ◽  
Frequency Noise ◽  
Equivalent Oxide Thickness ◽  
Low Frequency Noise ◽  
Noise Characterization
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