Tuneable Structural and Optical Properties of Crystalline InGaO3(ZnO)n Nanoparticles Synthesized via the Solid-phase Diffusion Process Using a Solution-based Precursor

2016 ◽  
Vol 3 (2) ◽  
pp. 313-318
Author(s):  
Yujie Guo ◽  
Yang Song ◽  
Jean Pierre Locquet ◽  
Jin Won Seo
2015 ◽  
Vol 26 (49) ◽  
pp. 495601 ◽  
Author(s):  
Yujie Guo ◽  
Bart Van Bilzen ◽  
Jean Pierre Locquet ◽  
Jin Won Seo

1995 ◽  
Vol 388 ◽  
Author(s):  
N. Kobayashi ◽  
H. Katsumata ◽  
Y. Makita ◽  
M. Hasegawa ◽  
N. Hayashi ◽  
...  

AbstractEpitaxial layers of Si1-x-yGexCy on Si(100) (x=0.13 and y=0.014 at peak concentration) were formed by ion implantation of Ge ions and C ions at room temperature (RT) and by subsequent IBIEC (ion-beam-induced epitaxial crystallization) process with 400keV Ge and ar ions at 300-400°C and SPEG (solid phase epitaxial growth) process up to 840°C. Crystallization up to the surface both by IBIEC and SPEG processes has been confirmed with RBS-channeling analysis. X-ray diffraction experiments have demonstrated strain compensation by incorporation of C atoms for IBIEC-grown Si1-x-yGexCy/Si samples, whereas strain accommodation due to C precipitation has been observed for SPEG-grown Si1-x-yGexCy/Si samples. Photoluminescence (PL) observed at 2K from IBIEC-grown samples has shown intense I1 peak with/without I1 related (Ar) peak and that from SPEG-grown samples has shown G line emission. these optical properties could suggest that small vacancy agglomeration is dominant in IBIEC-grown samples and C agglomeration is dominant in SPEG-grown samples, respectively.


2008 ◽  
Vol 105 (5) ◽  
pp. 711-719 ◽  
Author(s):  
I. M. Belousova ◽  
V. P. Belousov ◽  
V. M. Kiselev ◽  
T. D. Murav’eva ◽  
I. M. Kislyakov ◽  
...  

2018 ◽  
Vol 23 (3) ◽  
pp. 230-239
Author(s):  
E.P. Zaretskaya ◽  
◽  
V.F. Gremenok ◽  
A.V. Stanchik ◽  
A.N. Pyatlitski ◽  
...  

2016 ◽  
Vol 12 (3) ◽  
pp. 4394-4399
Author(s):  
Sura Ali Noaman ◽  
Rashid Owaid Kadhim ◽  
Saleem Azara Hussain

Tin Oxide and Indium doped Tin Oxide (SnO2:In) thin films were deposited on glass and Silicon  substrates  by  thermal evaporation technique.  X-ray diffraction pattern of  pure SnO2 and SnO2:In thin films annealed at 650oC and the results showed  that the structure have tetragonal phase with preferred orientation in (110) plane. AFM studies showed an inhibition of grain growth with increase in indium concentration. SEM studies of pure  SnO2 and  Indium doped tin oxide (SnO2:In) ) thin films showed that the films with regular distribution of particles and they have spherical shape.  Optical properties such as  Transmission , optical band-gap have been measured and calculated.


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