Surface modification of Y3Al5O12:Ce3+ phosphor by hydrofluoric acid wet etching

2013 ◽  
Vol 136 ◽  
pp. 351-354 ◽  
Author(s):  
Zhijiang He ◽  
Weihai Cheng ◽  
Zebin Li ◽  
Ying Liu ◽  
Qiongrong Ou ◽  
...  
Keyword(s):  
Surface Modification ◽  
Hydrofluoric Acid ◽  
Wet Etching

Top down nano technologies in surface modification of materials

Open Physics ◽  
2011 ◽  
Vol 9 (2) ◽  
Author(s):  
Branislav Radjenović ◽  
Marija Radmilović-Radjenović
Keyword(s):  
Surface Modification ◽  
Three Dimensional ◽  
Wet Etching ◽  
Plasma Reactors ◽  
Top Down ◽  
Isotropic Etching ◽  
Microelectronic Devices ◽  
Etching Profile ◽  
Simulation Results ◽  
Low K

AbstractThis article contains a broad overview of etch process as one of the most important top-down technologies widely used in semiconductor manufacturing and surface modification of nanostructures. In plasma etching process, the complexity comes from the introduction of new materials and from the constant reduction in dimensions of the structures in microelectronics. The emphasis was made on two types of etching processes: dry etching and wet etching illustrated by three dimensional (3D) simulation results for the etching profile evolution based on the level set method. The etching of low-k dielectrics has been demonstrated via modelling the porous materials. Finally, simulation results for the roughness formation during isotropic etching of nanocomposite materials as well as smoothing of the homogeneous materials have also been shown and analyzed. Simulation results, presented here, indicate that with shrinking microelectronic devices, plasma and wet etching interpretative and predictive modeling and simulation have become increasingly more attractive as a tool for design, control and optimization of plasma reactors.

Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acid

2000 ◽  
Vol 18 (4) ◽  
pp. 1211-1215 ◽  
Author(s):  
P. J. S. Mangat ◽  
W. J. Dauksher ◽  
R. Whig ◽  
W. L. O’Brien
Keyword(s):  
Surface Modification ◽  
Hydrofluoric Acid

scholarly journals Surface modification of magnesium alloy AZ31 by hydrofluoric acid treatment and its effect on the corrosion behaviour

2010 ◽  
Vol 518 (18) ◽  
pp. 5209-5218 ◽  
Author(s):  
T.F. da Conceicao ◽  
N. Scharnagl ◽  
C. Blawert ◽  
W. Dietzel ◽  
K.U. Kainer
Keyword(s):  
Surface Modification ◽  
Magnesium Alloy ◽  
Hydrofluoric Acid ◽  
Acid Treatment ◽  
Corrosion Behaviour ◽  
Alloy Az31 ◽  
Magnesium Alloy Az31

PHOTOLUMINESCENCE ENHANCEMENT AND THERMAL PERFORMANCE OF SURFACE MODIFIED Y3Al5O12:Ce3+ PHOSPHOR BY CHEMICAL WET ETCHING

2013 ◽  
Vol 06 (01) ◽  
pp. 1350008 ◽  
Author(s):  
ZHIJIANG HE ◽  
ZEBIN LI ◽  
XIAOXUAN FAN ◽  
WEIHAI CHENG ◽  
JIAQI JU ◽  
...  
Keyword(s):  
Surface Modification ◽  
Decay Rate ◽  
Thermal Performance ◽  
Smooth Surface ◽  
Wet Etching ◽  
Emission Power ◽  
Temperature Decay ◽  
Photoluminescence Enhancement ◽  
Lower Temperature ◽  
Surface Modified

Surface of Y3Al5O12 : Ce3+ Phosphor was modified by wet etching in 40% NH4F+CH3COOH (1:1) solution for 5 h. SEM results show that smooth surface of phosphor particles turn rough, and edge angles are less sharp as before. PL determinations indicate that backscattering loss of the excited light reduces by 3.9% and emission power is enhanced by 10.7%. Meanwhile, after the surface modification, YAG phosphor presents a lower temperature decay rate of 1.2% at 373 K, which is well explained by the configurational coordinate diagram. Therefore, this method can greatly enhance the efficient of light conversion, extraction and stabilization of pc-LED.

Tuning the reflectivity of high contrast gratings based on silicon and silica by means of wet etching with hydrofluoric acid

2012 ◽  
Author(s):  
Tassilo Jacobitz ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Ernst-Bernhard Kley ◽  
Andreas Tünnermann
Keyword(s):  
Hydrofluoric Acid ◽  
Wet Etching ◽  
High Contrast

Pre-metal dielectric PE TEOS oxide pitting in 3D NAND: Mechanism and solutions

2021 ◽  
Author(s):  
Peizhen Hong ◽  
Qiang Xu ◽  
Jingwen Hou ◽  
Mingkai Bai ◽  
Zhiguo Zhao ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Phosphoric Acid ◽  
Hydrofluoric Acid ◽  
Low Cost ◽  
Tetraethyl Orthosilicate ◽  
Wet Etching ◽  
Staircase Structure ◽  
Process Cost ◽  
The Cost ◽  
Density Plasma

Abstract In 3D NAND, as the stack number increases, the process cost becomes higher and higher, and the stress problem becomes more and more serious. Therefore, the low cost and low stress plasma enhanced Tetraethyl orthosilicate (PE TEOS), compared to high density plasma (HDP) oxide, shows its superiority as pre-metal dielectric (PMD) oxide layer in 3D NAND. This paper explores the challenges in the application of PE TEOS in 3D NAND PMD oxide layer.In our experiments, both PE TEOS and HDP are employed as the PMD oxide for 3D NAND staircase protection. There is not any void found in the two oxide structures. However, oxide pitting is spotted in the subsequent diluted hydrofluoric acid wet etching in the PE TEOS split. Moreover, we observe that the top silicon nitride corrodes in hot phosphoric acid. We investigate the mechanism of PE TEOS oxide pitting and silicon nitride corroding, and propose two solutions: 1) HDP oxide + PE TEOS, and 2) PE TEOS + dry etching.Experimental results demonstrate that our solutions can well address the issue of PE TEOS oxide pitting and effectively protect the staircase structure. This work extends the application of PE TEOS oxide of which the cost and the stress are both low in 3D NAND.

Deep Wet Etching in Hydrofluoric Acid, Nitric Acid, and Acetic Acid of Cavities in a Silicon Wafer

2013 ◽  
Vol 52 (7R) ◽  
pp. 076503 ◽  
Author(s):  
Zhou Yifan ◽  
Chen Sihai ◽  
Samson Edmond ◽  
Alain Bosseboeuf
Keyword(s):  
Acetic Acid ◽  
Nitric Acid ◽  
Silicon Wafer ◽  
Hydrofluoric Acid ◽  
Wet Etching

scholarly journals INFLUENCE OF DIFFERENT SURFACE TREATMENTS OF CAD/CAM HYBRID NANOCERAMICS CROWNS ON BOND STRENGTH OF RESIN COMPOSITE CEMENT

2018 ◽  
Vol 9 (1) ◽  
Author(s):  
Valentina Veselinović ◽  
Rebeka Rudolf ◽  
Nataša Trtić ◽  
Verica Pavlić ◽  
Radmila Arbutina ◽  
...  
Keyword(s):  
Surface Modification ◽  
Hydrofluoric Acid ◽  
Technological Development ◽  
Resin Composite ◽  
Testing Machine ◽  
Resin Cement ◽  
Control Group ◽  
Retention Force ◽  
Group I ◽  
Cad Cam

Introduction: Urgent demand for high-esthetic material, which at the same time has the possibility of absorption of mastication stress, has led to the technological development of hybrid nanoceramics used in CAD / CAM technology. Aim: The aim of the study was to evaluate the effects of different surface modification of hybrid nanoceramic crowns on the quality of the cement retention and the influence of the mastication stress after one year of function. Material and methods: 50 hybrid nanoceramic CAD/CAM crowns (CERASMART, GC) are cemented on titanium implant abutments with self-adhesive resin cement (G-CEM, LinkAce). The samples were divided into five main groups according to surface treatment (n=10): I (sandblasted with 50 microns Al2O3), II (treated with CERAMIC PRIMER II, GC), III (treated with 5% hydrofluoric acid), IV (treated with combination of 5% hydrofluoric acid and CERAMIC PRIMER II), V (control, non-treated group). The samples were storaged during 24 hours at 37°C, thermocycled and loaded under 10 000 mechanical cycles loads (simulation of 12 months of function). Retention forces measured in Universal testing machine. The data were represented as mean ± standard deviation, and for statistical analysis ANOVA test was used. Results: The highest initial retention force was demonstrated in the group IV (6.99±1.18), followed by group I (6.22±1.29), group III (5,97±1,25), group II (5,86±1,17) and control group samples (4.92±1.19). A statistically significant decline in retention force was recorded in all tested groups, with the lowest decrease observed in samples treated with a combination of 5% hydrofluoric acid and CERAMIC PRIMER II (6.08 ± 1.03). Conclusion: Mechanical and chemical surface modification can strongly influence the retentions between resin cement and hybrid nanoceramics. The results from this study are suggesting that the most efficient clinical outcome is the combination of 5% hidrofluoric acid and CERAMIC PRIMER II.

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