Optical properties and thermal stability of GaAsN alloy films

2007 ◽  
Vol 122-123 ◽  
pp. 182-184 ◽  
Author(s):  
T.X. Li ◽  
P.P. Chen ◽  
T. Mori ◽  
L.H. Bai ◽  
T. Yao ◽  
...  
1986 ◽  
Vol 70 ◽  
Author(s):  
W -Y Lee ◽  
C. R. Davis ◽  
G. Lim ◽  
H. Coufal ◽  
F. Sequeda

ABSTRACTThe optical properties and the thermal stability of Ge and Sn doped TeOx films prepared by coevaporating TeO2, Te, Ge and Sn are reported. These films are amorphous as-deposited and crystalline Te appears after annealing at, e.g., 100 to 250°C. As expected, the addition of Ge and Sn increases the absorption of the TeOx films at the wavelength of interest (e.g., 830 nm). However, the thermal stability of (TeO1.1)1-xGex (x=0 to ~0.7) films is found to decrease with increasing x initially, starting to increase with increasing x only after x reaches a value between 0.3 and 0.4. These results differ from those reported previously for Ge and Sn-doped TeOx films and from those observed for Te-Ge alloy films. Interpretations of these results based on a solid state reaction between TeO2 and Ge or Sn during deposition are presented and discussed.


2001 ◽  
Vol 670 ◽  
Author(s):  
Min-Joo Kim ◽  
Hyo-Jick Choi ◽  
Dae-Hong Ko ◽  
Ja-Hum Ku ◽  
Siyoung Choi ◽  
...  

ABSTRACTThe silicidation reactions and thermal stability of Co silicide formed from Co-Ta/Si systems have been investigated. In case of Co-Ta alloy process, the formation of low resistive CoSi2phase is delayed to about 660°C, as compared to conventional Co/Si system. Moreover, the presence of Ta in Co-Ta alloy films reduces the silicidation reaction rate, resulting in the strong preferential orientation in CoSi2 films. Upon high temperature post annealing in the furnace, the sheet resistance of Co-silicide formed from Co/Si systems increases significantly, while that of Co-Ta/Si systems maintains low. This is due to the formation of TaSi2 at the grain boundaries and surface of Co-silicide films, which prevents the grain boundary migration thereby slowing the agglomeration. Therefore, from our research, increased thermal stability of Co-silicide films was successfully obtained from Co-Ta alloy process.


2009 ◽  
Vol 517 (16) ◽  
pp. 4694-4697 ◽  
Author(s):  
T. Wagner ◽  
J. Orava ◽  
J. Prikryl ◽  
T. Kohoutek ◽  
M. Bartos ◽  
...  

2020 ◽  
Vol 46 (15) ◽  
pp. 24443-24448
Author(s):  
L. Krishna Bharat ◽  
Harishkumarreddy Patnam ◽  
Zhanna V. Cherepanova ◽  
Jae Su Yu

Solar Energy ◽  
2015 ◽  
Vol 111 ◽  
pp. 357-363 ◽  
Author(s):  
Z.Y. Nuru ◽  
M. Msimanga ◽  
T.F.G. Muller ◽  
C.J. Arendse ◽  
C. Mtshali ◽  
...  

2009 ◽  
Vol 93 (3) ◽  
pp. 315-323 ◽  
Author(s):  
Harish C. Barshilia ◽  
N. Selvakumar ◽  
G. Vignesh ◽  
K.S. Rajam ◽  
A. Biswas

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