Field emission scanning electron and atomic force microscopy, and Raman and X-ray photoelectron spectroscopy characterization of near-isogenic soft and hard wheat kernels and corresponding flours

2010 ◽  
Vol 52 (2) ◽  
pp. 136-142 ◽  
Author(s):  
L. Scudiero ◽  
Craig F. Morris
Keyword(s):  
Atomic Force Microscopy ◽  
Field Emission ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Force Microscopy ◽  
Hard Wheat ◽  
Atomic Force ◽  
Wheat Kernels ◽  
Scanning Electron

Characterization of Multiple Functional Solid Line of Graphite Ink Surface Printed by Micro-Flexographic

2015 ◽  
Vol 752-753 ◽  
pp. 1379-1383
Author(s):  
M.I. Maksud ◽  
Mohd Sallehuddin Yusof ◽  
Zaidi Embong
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Photoelectron Spectroscopy ◽  
Printing Plate ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Flexographic Printing ◽  
Scanning Electron

The purpose of this paper is to study a ink surface morphology, quantify the chemical composition involved in processing of graphite ink printed by flexographic printing. The methodology is to use surface sensitive technique, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). As a finding we successfully achieved 25 micron lines array using PDMS printing plate. The Originality and value of this work is surface sensitive techniques like XPS, AFM and FESEM were exclusively used in order to characterize graphite inks printed by flexographic method, using PDMS printing plate.

Atomic force microscopy and X-ray photoelectron spectroscopy characterization of low-energy ion sputtered mica

2007 ◽  
Vol 601 (13) ◽  
pp. 2735-2739 ◽  
Author(s):  
Renato Buzio ◽  
Andrea Toma ◽  
Andrea Chincarini ◽  
Francesco Buatier de Mongeot ◽  
Corrado Boragno ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Investigation of Ti/CuO interface by X-ray photoelectron spectroscopy and atomic force microscopy

2018 ◽  
Vol 51 (2) ◽  
pp. 246-253
Author(s):  
Dev Raj Chopra ◽  
Justin Seth Pearson ◽  
Darius Durant ◽  
Ritesh Bhakta ◽  
Anil R. Chourasia
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Comparative Study of Field Emission-Scanning Electron Microscopy and Atomic Force Microscopy to Assess Self-assembled Monolayer Coverage on Any Type of Substrate

1999 ◽  
Vol 5 (6) ◽  
pp. 413-419 ◽  
Author(s):  
Bernardo R.A. Neves ◽  
Michael E. Salmon ◽  
Phillip E. Russell ◽  
E. Barry Troughton
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Comparative Study ◽  
Field Emission ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Self Assembled ◽  
Scanning Electron

Abstract: In this work, we show how field emission–scanning electron microscopy (FE-SEM) can be a useful tool for the study of self-assembled monolayer systems. We have carried out a comparative study using FE-SEM and atomic force microscopy (AFM) to assess the morphology and coverage of self-assembled monolayers (SAM) on different substrates. The results show that FE-SEM images present the same qualitative information obtained by AFM images when the SAM is deposited on a smooth substrate (e.g., mica). Further experiments with rough substrates (e.g., Al grains on glass) show that FE-SEM is capable of unambiguously identifying SAMs on any type of substrate, whereas AFM has significant difficulties in identifying SAMs on rough surfaces.

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