The dielectric function of Mgy NiHx thin films ()

2007 ◽  
Vol 430 (1-2) ◽  
pp. 13-18 ◽  
Author(s):  
W. Lohstroh ◽  
R.J. Westerwaal ◽  
J.L.M. van Mechelen ◽  
H. Schreuders ◽  
B. Dam ◽  
...  
2004 ◽  
Vol 84 (2) ◽  
pp. 200-202 ◽  
Author(s):  
M. Schubert ◽  
C. Bundesmann ◽  
G. Jacopic ◽  
H. Maresch ◽  
H. Arwin

2019 ◽  
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pp. 085802 ◽  
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Jiamin Liu ◽  
Jianbin Lin ◽  
Hao Jiang ◽  
Honggang Gu ◽  
Xiuguo Chen ◽  
...  

2014 ◽  
Vol 571 ◽  
pp. 593-596 ◽  
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E. Mammadov ◽  
N. Naghavi ◽  
Z. Jehl ◽  
G. Renou ◽  
T. Tiwald ◽  
...  

1994 ◽  
Vol 9 (2) ◽  
pp. 426-430 ◽  
Author(s):  
V.P. Dravid ◽  
H. Zhang ◽  
L.A. Wills ◽  
B.W. Wessels

Thin films of BaTiO3 deposited on (100)LaAlO3 substrate by metal-organic chemical vapor deposition (MOCVD) are investigated using several electron-optical techniques. Combined high resolution transmission electron microscopy (HRTEM), electron energy loss spectrometry (EELS), and convergent beam electron diffraction (CBED) indicate a substantial influence of lattice strain on the structural and optical characteristics of BaTiO3 films. Spatially resolved EELS and CBED studies indicate that the substrate influence persists up to about 40 nm away from the interface. The changes in the dielectric function of the films, as inferred from spatially resolved EELS, appear to correlate well with internal lattice strain in the films as deduced from convergent beam electron diffraction (CBED).


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