In situ synthesis and electrical properties of CuW–La2O3 composites

Author(s):  
Kun Qian ◽  
Shuhua Liang ◽  
Peng Xiao ◽  
Xianhui Wang
2009 ◽  
Author(s):  
David H. Wang ◽  
J. David Jacobs ◽  
Aaron Trionfi ◽  
Michael J. Arlen ◽  
Julia W. P. Hsu ◽  
...  

2016 ◽  
Vol 42 (10) ◽  
pp. 12345-12351 ◽  
Author(s):  
Jianmei Pan ◽  
Xuehua Yan ◽  
Xiaonong Cheng ◽  
Wei Shen ◽  
Shaoxin Li ◽  
...  

2021 ◽  
pp. 131133
Author(s):  
Meiling Gao ◽  
Xianglong Wan ◽  
Shengfa Lai ◽  
Hao Cui ◽  
Zhibo Chen ◽  
...  

Author(s):  
F. M. Ross ◽  
R. Hull ◽  
D. Bahnck ◽  
J. C. Bean ◽  
L. J. Peticolas ◽  
...  

We describe an investigation of the electrical properties of interfacial dislocations in strained layer heterostructures. We have been measuring both the structural and electrical characteristics of strained layer p-n junction diodes simultaneously in a transmission electron microscope, enabling us to correlate changes in the electrical characteristics of a device with the formation of dislocations.The presence of dislocations within an electronic device is known to degrade the device performance. This degradation is of increasing significance in the design and processing of novel strained layer devices which may require layer thicknesses above the critical thickness (hc), where it is energetically favourable for the layers to relax by the formation of misfit dislocations at the strained interfaces. In order to quantify how device performance is affected when relaxation occurs we have therefore been investigating the electrical properties of dislocations at the p-n junction in Si/GeSi diodes.


2013 ◽  
Vol 30 (6) ◽  
pp. 667
Author(s):  
Zhenzhen WANG ◽  
Fangfang LI ◽  
Han GUO ◽  
Jiuju FENG ◽  
Aijun WANG

2017 ◽  
Vol 101 (3) ◽  
pp. 1371-1380 ◽  
Author(s):  
Tao Li ◽  
Yulei Zhang ◽  
Jia Sun ◽  
Jincui Ren ◽  
Pengfei Zhang ◽  
...  

2021 ◽  
Vol 546 ◽  
pp. 149019
Author(s):  
Bao Jin ◽  
Jun Zhao ◽  
Guangyan Chen ◽  
Yongyong He ◽  
Yiyao Huang ◽  
...  

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