High resolution studies of low-energy electron attachment to SF5Cl: Product anions and absolute cross sections

2006 ◽  
Vol 252 (3) ◽  
pp. 234-241 ◽  
Author(s):  
M. Braun ◽  
M.-W. Ruf ◽  
H. Hotop ◽  
P. Cicman ◽  
P. Scheier ◽  
...  
Keyword(s):  
High Resolution ◽  
Cross Sections ◽  
Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

High resolution study of anion formation in low-energy electron attachment to SF6 molecules in a seeded supersonic beam

2005 ◽  
Vol 35 (2) ◽  
pp. 177-191 ◽  
Author(s):  
M. Braun ◽  
S. Barsotti ◽  
S. Marienfeld ◽  
E. Leber ◽  
J. M. Weber ◽  
...  
Keyword(s):  
High Resolution ◽  
Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
Anion Formation ◽  
Low Energy Electron ◽  
Resolution Study

High resolution low-energy electron attachment to CF3I

2005 ◽  
Vol 39 (1) ◽  
pp. 105-126 ◽  
Author(s):  
S Marienfeld ◽  
I I Fabrikant ◽  
M Braun ◽  
M-W Ruf ◽  
H Hotop
Keyword(s):  
High Resolution ◽  
Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

Performance Evaluation of a Novel Type of Low-Energy Electron Microscope

1990 ◽  
Vol 48 (1) ◽  
pp. 354-355
Author(s):  
Bertholdand Senftinger ◽  
Helmut Liebl
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Field Strength ◽  
Numerical Aperture ◽  
Low Energy ◽  
Energy Electron ◽  
High Resolution Imaging ◽  
Lens System ◽  
Resolution Imaging ◽  
Low Energy Electron

During the last few years the investigation of clean and adsorbate-covered solid surfaces as well as thin-film growth and molecular dynamics have given rise to a constant demand for high-resolution imaging microscopy with reflected and diffracted low energy electrons as well as photo-electrons. A recent successful implementation of a UHV low-energy electron microscope by Bauer and Telieps encouraged us to construct such a low energy electron microscope (LEEM) for high-resolution imaging incorporating several novel design features, which is described more detailed elsewhere.The constraint of high field strength at the surface required to keep the aberrations caused by the accelerating field small and high UV photon intensity to get an improved signal-to-noise ratio for photoemission led to the design of a tetrode emission lens system capable of also focusing the UV light at the surface through an integrated Schwarzschild-type objective. Fig. 1 shows an axial section of the emission lens in the LEEM with sample (28) and part of the sample holder (29). The integrated mirror objective (50a, 50b) is used for visual in situ microscopic observation of the sample as well as for UV illumination. The electron optical components and the sample with accelerating field followed by an einzel lens form a tetrode system. In order to keep the field strength high, the sample is separated from the first element of the einzel lens by only 1.6 mm. With a numerical aperture of 0.5 for the Schwarzschild objective the orifice in the first element of the einzel lens has to be about 3.0 mm in diameter. Considering the much smaller distance to the sample one can expect intense distortions of the accelerating field in front of the sample. Because the achievable lateral resolution depends mainly on the quality of the first imaging step, careful investigation of the aberrations caused by the emission lens system had to be done in order to avoid sacrificing high lateral resolution for larger numerical aperture.

scholarly journals Selective bond cleavage in RAFT agents promoted by low‐energy electron attachment

2021 ◽  
Author(s):  
Farhad Izadi ◽  
Eugene Arthur-Baidoo ◽  
Lisa T. Strover ◽  
Li-Juan Yu ◽  
Michelle L. Coote ◽  
...  
Keyword(s):  
Bond Cleavage ◽  
Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

Low‐energy electron attachment to BCl3

1990 ◽  
Vol 67 (2) ◽  
pp. 675-678 ◽  
Author(s):  
Z. Lj. Petrović ◽  
W. C. Wang ◽  
M. Suto ◽  
J. C. Han ◽  
L. C. Lee
Keyword(s):  
Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron
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