Negative ion formation from photoexcited carbon tetrachloride and silicon tetrachloride studied by negative-ion mass spectrometry in the range of 12.4–31.0eV
2008 ◽
Vol 163
(1-3)
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pp. 40-44
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1999 ◽
Vol 40
(2)
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pp. 302-308
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1975 ◽
Vol 10
(12)
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pp. 1047-1057
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1980 ◽
Vol 15
(5)
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pp. 263-267
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Keyword(s):