Atomic layer deposition of amorphous iron phosphates on carbon nanotubes as cathode materials for lithium-ion batteries

2015 ◽  
Vol 162 ◽  
pp. 275-281 ◽  
Author(s):  
Jian Liu ◽  
Biwei Xiao ◽  
Mohammad N. Banis ◽  
Ruying Li ◽  
Tsun-Kong Sham ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Cathode Materials ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Amorphous Iron ◽  
Iron Phosphates ◽  
Layer Deposition

Stabilizing an amorphous V2O5/carbon nanotube paper electrode with conformal TiO2 coating by atomic layer deposition for lithium ion batteries

2016 ◽  
Vol 4 (2) ◽  
pp. 537-544 ◽  
Author(s):  
Ming Xie ◽  
Xiang Sun ◽  
Hongtao Sun ◽  
Tim Porcelli ◽  
Steven M. George ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Nanotubes ◽  
Carbon Nanotube ◽  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Multi Walled Carbon Nanotubes ◽  
Walled Carbon Nanotubes

Amorphous V2O5 (a-V2O5) thin films were conformally coated onto the surface of hydroxyl (–OH) functionalized multi-walled carbon nanotubes (CNTs) and carbon nanotube (CNT) paper using atomic layer deposition (ALD).

Plasma Enhanced Atomic Layer Deposition of Nickel and Cobalt Phosphate for Lithium Ion Batteries

2022 ◽  
Author(s):  
Lowie Henderick ◽  
Ruben Blomme ◽  
Matthias Marcus Minjauw ◽  
Jonas Keukelier ◽  
Johan Meersschaut ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Substrate Temperature ◽  
Lithium Ion Batteries ◽  
Oxygen Plasma ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Nickel Phosphate ◽  
Cobalt Phosphate

A plasma-enhanced ALD process has been developed to deposit nickel phosphate. The process combines a trimethylphosphate (TMP) plasma with an oxygen plasma and nickelocene at a substrate temperature of 300°C....

scholarly journals Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Energies ◽  
2020 ◽  
Vol 13 (9) ◽  
pp. 2345
Author(s):  
Maxim Maximov ◽  
Denis Nazarov ◽  
Aleksander Rumyantsev ◽  
Yury Koshtyal ◽  
Ilya Ezhov ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Silicon Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition ◽  
Nickel Silicon

Lithium nickelate (LiNiO2) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp2) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)2 precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li2SiO3 and Li2Si2O5 were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO2. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

Sign in / Sign up

Export Citation Format

Share Document