Passive film growth mechanism of nanocrystalline 304 stainless steel prepared by magnetron sputtering and deep rolling techniques

2011 ◽  
Vol 56 (22) ◽  
pp. 7740-7748 ◽  
Author(s):  
Chen Pan ◽  
Li Liu ◽  
Ying Li ◽  
Shenggang Wang ◽  
Fuhui Wang
Keyword(s):  
Stainless Steel ◽  
Magnetron Sputtering ◽  
Passive Film ◽  
Growth Mechanism ◽  
Film Growth ◽  
304 Stainless Steel ◽  
Deep Rolling ◽  
Passive Film Growth

Kinetics of Passive Film Growth on 304 Stainless Steel in H2SO4 Pickling Solution under Chemical Oxidation

CORROSION ◽  
10.5006/2680 ◽  
2018 ◽  
Vol 74 (6) ◽  
pp. 705-714 ◽  
Author(s):  
Yingying Yue ◽  
Chengjun Liu ◽  
Edouard Asselin ◽  
Peiyang Shi ◽  
Maofa Jiang
Keyword(s):  
Stainless Steel ◽  
Electrochemical Impedance Spectroscopy ◽  
Impedance Spectroscopy ◽  
Passive Film ◽  
Polarization Resistance ◽  
Film Growth ◽  
Electrochemical Impedance ◽  
304 Stainless Steel ◽  
Passive Film Growth ◽  
Kinetics Of

H2SO4-H2O2 mixtures are a promising and environmentally friendly passivation medium for the stainless-steel pickling process. The corrosion behavior of stainless steel is highly dependent on the kinetics of passive film growth. Long-term electrochemical measurements, including polarization resistance, open circuit potential (OCP), and electrochemical impedance spectroscopy (EIS) measurements were performed to investigate the evolution of the passive state of 304 stainless steel. According to the OCP results, an active-passive transition takes place in 10 ks in 0.5 M H2SO4 solution containing 0.005 M to 0.3 M H2O2. Polarization resistance results indicate that the passive film thickness keeps growing after OCP stabilization in the presence of H2O2. Electrochemical impedance spectroscopy (EIS) results confirmed that the growth of the passive film in H2SO4-H2O2 solutions takes about 9 h. Additionally, according to the Point Defect Model (PDM) and Mott–Schottky analysis, the semiconductor properties of the passive film on 304 stainless steel in H2SO4-H2O2 solution were studied. The results indicate that the passive film is an n-type semiconductor. The donor density is in the range of 1.6 × 10−21 cm−3 to 24 and decreases exponentially with increasing film formation potential (this potential coincides with the final OCP in the corresponding H2SO4-H2O2 solutions). By postulating that most donors are oxygen vacancies, the point defect properties including diffusivity and electrical field strength are obtained.

Direct evidence of passive film growth on 316 stainless steel in alkaline solution

2017 ◽  
Vol 131 ◽  
pp. 168-174 ◽  
Author(s):  
Bowei Zhang ◽  
Shiji Hao ◽  
Junsheng Wu ◽  
Xiaogang Li ◽  
Chaojiang Li ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Passive Film ◽  
Alkaline Solution ◽  
Direct Evidence ◽  
Film Growth ◽  
316 Stainless Steel ◽  
Passive Film Growth

Effect of Milling Parameters on the Stability of the Passive Film of AISI 304 Stainless Steel

2021 ◽  
Author(s):  
Rafael dos Santos Pereira ◽  
Roosevelt Droppa ◽  
Mara Cristina Lopes de Oliveira ◽  
Renato Altobelli Antunes
Keyword(s):  
Stainless Steel ◽  
Passive Film ◽  
304 Stainless Steel ◽  
Aisi 304 Stainless Steel ◽  
Aisi 304 ◽  
Milling Parameters ◽  
The Stability
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