An investigation of cell-impedance-controlled lithium transport through LiCoO2/Li1−δMn2O4 bilayer film electrode prepared by rf magnetron sputtering

2006 ◽  
Vol 52 (1) ◽  
pp. 152-160 ◽  
Author(s):  
Kyoung-Hoon Kim ◽  
Su-Il Pyun ◽  
Kyu-Nam Jung
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Bilayer Film ◽  
Film Electrode ◽  
Cell Impedance ◽  
Lithium Transport

scholarly journals Fabrication of Dye-Sensitized Solar Cells with a 3D Nanostructured Electrode

2010 ◽  
Vol 2010 ◽  
pp. 1-7 ◽  
Author(s):  
Guo-Yang Chen ◽  
Ming-Way Lee ◽  
Gou-Jen Wang
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Conversion Efficiency ◽  
Indium Tin Oxide ◽  
Rf Magnetron Sputtering ◽  
Film Electrode ◽  
Dye Sensitized ◽  
Ito Electrode ◽  
Solar Conversion ◽  
Solar Conversion Efficiency

A novel Dye-Sensitized Solar Cell (DSSC) scheme for better solar conversion efficiency is proposed. The distinctive characteristic of this novel scheme is that the conventional thin film electrode is replaced by a 3D nanostructured indium tin oxide (ITO) electrode, which was fabricated using RF magnetron sputtering with an anodic aluminum oxide (AAO) template. The template was prepared by immersing the barrier-layer side of an AAO film into a 30 wt% phosphoric acid solution to produce a contrasting surface. RF magnetron sputtering was then used to deposit a 3D nanostructured ITO thin film on the template. The crystallinity and conductivity of the 3D ITO films were further enhanced by annealing. Titanium dioxide nanoparticles were electrophoretically deposited on the 3D ITO film after which the proposed DSSC was formed by filling vacant spaces in the 3D nanostructured ITO electrode with dye. The measured solar conversion efficiency of the device was 0.125%. It presents a 5-fold improvement over that of conventional spin-coatedTiO2film electrode DSSCs.

Single Crystal, High Band Gap CdS Thin Films Grown by RF Magnetron Sputtering in Argon Atmosphere for Solar Cell Applications

2018 ◽  
Vol 10 (3) ◽  
pp. 03005-1-03005-6 ◽  
Author(s):  
Rupali Kulkarni ◽  
◽  
Amit Pawbake ◽  
Ravindra Waykar ◽  
Ashok Jadhawar ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Magnetron Sputtering ◽  
Single Crystal ◽  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
Argon Atmosphere ◽  
Cds Thin Films ◽  
High Band

scholarly journals Effects of Long Durations of RF–Magnetron Sputtering Deposition of Hydroxyapatite on Titanium Dental Implants

2021 ◽  
Author(s):  
Ihab Nabeel Safi ◽  
Basima Mohammed Ali Hussein ◽  
Hikmat J. Aljudy ◽  
Mustafa S. Tukmachi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Dental Implants ◽  
Substrate Surface ◽  
Rf Magnetron Sputtering ◽  
P Value ◽  
Edx Analysis ◽  
Significant Difference ◽  
Scanning Electron

Abstract Objectives Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)–magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness. Materials and Methods Two types of substrates: discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF–magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electron microscopy–energy dispersive X-ray (EDX) analysis, atomic force microscopy, and Vickers hardness (VH). Student’s t-test was used. Results All FESEM images showed a homogeneous, continuous, and crack-free HA coat with a rough surface. EDX analysis revealed inclusion of HA particles within the substrate surface in a calcium (Ca)/phosphorus (P) ratio (16.58/11.31) close to that of HA. Elemental and EDX analyses showed Ca, Ti, P, and oxygen within Ti. The FESEM views at a cross-section of the substrate showed an average of 7 µm coat thickness. Moreover, these images revealed a dense, compact, and uniform continuous adhesion between the coat layer and the substrate. Roughness result indicated highly significant difference between uncoated Ti and HA coat (p-value < 0.05). A significant improvement in the VH value was observed when coat hardness was compared with the Ti substrate hardness (p-value < 0.05). Conclusion Prolonged magnetron sputtering successfully coat Ti dental implants with HA in micrometers thickness which is well adhered essentially in excellent osseointegration.

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