Investigations on the monolayer structure of thiol SAMs and the influence of conjugated π-bonds on the electronic molecular conductivity

2003 ◽  
Vol 49 (1) ◽  
pp. 167-174 ◽  
Author(s):  
N. Krings ◽  
H.-H. Strehblow ◽  
J. Kohnert ◽  
H.-D. Martin
2021 ◽  
Vol 50 (16) ◽  
pp. 5540-5551
Author(s):  
Almudena Notario-Estévez ◽  
Xavier López ◽  
Coen de Graaf

This computational study presents the molecular conduction properties of polyoxovanadates V6O19 (Lindqvist-type) and V18O42, as possible successors of the materials currently in use in complementary metal–oxide semiconductor (CMOS) technology.


2010 ◽  
Vol 97 (26) ◽  
pp. 262114 ◽  
Author(s):  
M. G. Vergniory ◽  
J. M. Granadino-Roldan ◽  
A. Garcia-Lekue ◽  
Lin-Wang Wang

1998 ◽  
Vol 9 (1-4) ◽  
pp. 352-355 ◽  
Author(s):  
Carl Winter ◽  
Josua Kashammer ◽  
Silvia Mittler-Neher ◽  
Roland A. Fischer
Keyword(s):  

1992 ◽  
Vol 79 (6) ◽  
pp. 267-268 ◽  
Author(s):  
E. Diemann ◽  
A. Branding ◽  
A. M�ller

Langmuir ◽  
2009 ◽  
Vol 25 (8) ◽  
pp. 4564-4570 ◽  
Author(s):  
K. Jans ◽  
B. Van Meerbergen ◽  
G. Reekmans ◽  
K. Bonroy ◽  
W. Annaert ◽  
...  

2011 ◽  
Vol 660 (1) ◽  
pp. 37-44 ◽  
Author(s):  
Reza Karimi Shervedani ◽  
Sima Pourbeyram ◽  
Hassan Sabzyan

2019 ◽  
Author(s):  
Nathaniel Miller ◽  
Geoffrey Hutchison

While photopatterning is in widespread use for patterning inorganic semiconductors, patterning of widely-used gold-thiol organic self-assembled monolayers is typically done with contact methods. Through common atomic force microscope techniques and quantification of the energy impinging on the target surface, the energy required for UV-photooxidation of Au-Thiol SAMs can be determined. This quantification allows for the precise control of features using simple shadow masking from electron microscopy grids or other targets. Beyond characterizing the accuracy and resolution of features, the pattern stability of the resulting monolayers is examined indicating a drive toward phase segregation and increasing order of the mixed monolayers.


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