Enhancement of the field emission properties of low-temperature-growth multi-wall carbon nanotubes by KrF excimer laser irradiation post-treatment

2006 ◽  
Vol 15 (11-12) ◽  
pp. 2010-2014 ◽  
Author(s):  
Chia-Hung Li ◽  
Han-Chi Liu ◽  
Shih-Chun Tseng ◽  
Yi-Ping Lin ◽  
Shih-Pu Chen ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Low Temperature ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Field Emission ◽  
Temperature Growth ◽  
Multi Wall Carbon Nanotubes ◽  
Field Emission Properties ◽  
Excimer Laser Irradiation ◽  
Krf Excimer Laser

scholarly journals Seppen-Katamuki Analysis of Field Emission from Carbon Nanotubes after KrF-excimer Laser Irradiation

Shinku ◽  
2005 ◽  
Vol 48 (5) ◽  
pp. 325-328
Author(s):  
Yoshinori KAWAMURA ◽  
Katsuyuki ISHIZU ◽  
Yasuhito GOTOH ◽  
Hiroshi TSUJI ◽  
Junzo ISHIKAWA ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Field Emission ◽  
Excimer Laser Irradiation ◽  
Krf Excimer Laser

scholarly journals Formation of Varistor Layer at the Surface of SrTiO3-Based Ceramics by KrF Excimer Laser Irradiation.

1999 ◽  
Vol 107 (1252) ◽  
pp. 1229-1231 ◽  
Author(s):  
Jong-Won YOON ◽  
Katsuki HIGAKI ◽  
Masaru MIYAYAMA ◽  
Tetsuichi KUDO
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Excimer Laser Irradiation ◽  
Krf Excimer Laser

Improvement of resistance to corrosion of stainless steel 304 in acid solutions by simultaneous deposition with doping of Si using KrF excimer laser

1990 ◽  
Vol 5 (12) ◽  
pp. 2835-2840 ◽  
Author(s):  
Koji Sugioka ◽  
Hideo Tashiro ◽  
Koichi Toyoda ◽  
Hideyuki Murakami ◽  
Hiroshi Takai
Keyword(s):  
Stainless Steel ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Polarization Resistance ◽  
Cathodic Polarization ◽  
Acid Solutions ◽  
Stainless Steel 304 ◽  
Quantitative Verification ◽  
Excimer Laser Irradiation ◽  
Krf Excimer Laser

The chemical stability of the surface of stainless steel (SUS) 304 in acid immersion tests is greatly improved by the laser implant-deposition (LID) process, i.e., the simultaneous deposition and incorporation of silicon by KrF excimer laser irradiation. The etching depths of the treated samples in 1.32 N HCl solution are substantially zero at the laser irradiation conditions of more than 40 pulses and of more than 400 mJ/cm2 at the surface. By the quantitative verification of cathodic polarization in 1 N H2SO4, the highest polarization resistance is estimated to be 26.7 times that of the nontreated sample.

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