Optical properties of Ba 0.6 K 0.4 Fe 2 As 2 thin film prepared by pulsed laser deposition and subsequent post-annealing process

2017 ◽  
Vol 17 (7) ◽  
pp. 976-979 ◽  
Author(s):  
Seokbae Lee ◽  
Yu-Seong Seo ◽  
Seulki Roh ◽  
Nam Hoon Lee ◽  
Won Nam Kang ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Annealing Process ◽  
Laser Deposition ◽  
Post Annealing

Structural and optical properties of tellurite thin film glasses deposited by pulsed laser deposition

2011 ◽  
Vol 520 (1) ◽  
pp. 131-137 ◽  
Author(s):  
D. Munoz-Martin ◽  
J.M. Fernandez-Navarro ◽  
J. Gonzalo ◽  
G. Jose ◽  
A. Jha ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Structural And Optical Properties

Effect of Annealing on Structural and Optical Properties of Pulsed Laser Deposited Titanium Dioxide Thin Films

2009 ◽  
Vol 67 ◽  
pp. 65-70 ◽  
Author(s):  
Gaurav Shukla ◽  
Alika K. Khare
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Annealing Temperature ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tio2 Thin Films ◽  
Post Annealing ◽  
Post Annealing Temperature

TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors, cancer therapy and high effect solar cell. However, investigations demonstrated that the properties and applications of titanium oxide films depend upon the nature of the crystalline phases present in the films, i.e. anatase and rutile phases. We report on the pulsed laser deposition of high quality TiO2 thin films. Pulsed Laser deposition of TiO2 thin films were performed in different ambient viz. oxygen, argon and vacuum, using a second harmonic of Nd:YAG laser of 6 ns pulse width. These deposited films of TiO2 were further annealed for 5hrs in air at different temperatures. TiO2 thin films were characterized using x-ray diffraction, SEM, photoluminescence, transmittance and reflectance. We observed effect of annealing over structural, morphological and optical properties of TiO2 thin films. The anatase phase of as-deposited TiO2 thin films is found to change into rutile phase with increased annealing temperature. Increase in crystalline behaviour of thin films with post-annealing temperature is also observed. Surface morphology of TiO2 thin films is dependent upon ambient pressure and post- annealing temperature. TiO2 thin films are found to be optically transparent with very low reflectivity hence will be suitable for antireflection coating applications.

Growth and optical properties of Ge oxide thin film on silicon substrate by pulsed laser deposition

2004 ◽  
Vol 331 (3-4) ◽  
pp. 248-251 ◽  
Author(s):  
Y.F. Mei ◽  
G.G. Siu ◽  
X.H. Huang ◽  
K.W. Cheah ◽  
Z.G. Dong ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Silicon Substrate ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Film
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