Forming process of unipolar resistance switching in Ta2O5−x thin films

2013 ◽  
Vol 13 (7) ◽  
pp. 1172-1174 ◽  
Author(s):  
Shin Buhm Lee ◽  
Hyang Keun Yoo ◽  
Bo Soo Kang
2012 ◽  
Vol 12 (3) ◽  
pp. 846-848 ◽  
Author(s):  
Moon Jee Yoon ◽  
Shin Buhm Lee ◽  
Hyang Keun Yoo ◽  
Soobin Sinn ◽  
Bo Soo Kang

2009 ◽  
Vol 1160 ◽  
Author(s):  
Xiaomin Li

AbstractIn this paper, the undoped SrTiO3 (STO) and Indium doped STO (SrTi1-xInxO3: STIO) thin films were grown on Pt/Ti/SiO2/Si substrates by pulsed laser deposition with low substrate temperature. For undoped STO film, the influences of the forming processes on their resistive switching properties were studied by current and voltage controlled I-V sweeps, respectively. An obvious current controlled negative differential conductance phenomenon was found in both polarities of the electrical field. However, for low Indium doped STIO (x=0.1), the filament related resistance switching was observed in both the current and voltage I-V sweeps. And for high Indium doped STIO (x=0.2), a resistance switching with a reverse direction change to that in undoped STO can be obtained by a proper forming process. Based on these results, the reversible change of the Schottky like barrier at the grain boundary by the migration of oxygen vacancies were proposed to interpret the mechanism of the resistance switching.


2009 ◽  
Vol 66 ◽  
pp. 131-134
Author(s):  
X. Cao ◽  
Xiao Min Li ◽  
Wei Dong Yu ◽  
Rui Yang ◽  
Xin Jun Liu

Polycrystalline NiO thin films were fabricated on Pt (111)/Ti/SiO2/Si substrates by thermal oxidation of the evaporated Ni films. Pt/NiO/Pt structures were prepared, and they showed reversible resistance switching behaviors. When the compliance set current was varied from 5 mA to 40 mA, the on-state currents increased, while the on-state resistances decreased. It is probably attributed to higher current compliance resulted in the formation of stronger and less resistive filaments, which in turn need more energy and power for their rupture. The resistive switching in NiO thin films is closely related to the formation and rupture of conducting filaments.


2006 ◽  
Vol 243 (9) ◽  
pp. 2089-2097 ◽  
Author(s):  
A. Ignatiev ◽  
N. J. Wu ◽  
X. Chen ◽  
S. Q. Liu ◽  
C. Papagianni ◽  
...  

2015 ◽  
Vol 3 (43) ◽  
pp. 11357-11365 ◽  
Author(s):  
Geert Rampelberg ◽  
Bob De Schutter ◽  
Wouter Devulder ◽  
Koen Martens ◽  
Iuliana Radu ◽  
...  

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.


2010 ◽  
Vol 97 (4) ◽  
pp. 042101 ◽  
Author(s):  
Kuibo Yin ◽  
Mi Li ◽  
Yiwei Liu ◽  
Congli He ◽  
Fei Zhuge ◽  
...  

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