Fabrication of rough Al doped ZnO films deposited by low pressure chemical vapor deposition for high efficiency thin film solar cells

2010 ◽  
Vol 10 (3) ◽  
pp. S459-S462 ◽  
Author(s):  
Doyoung Kim ◽  
Ilgu Yun ◽  
Hyungjun Kim
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Efficiency ◽  
Chemical Vapor ◽  
Thin Film Solar Cells ◽  
Zno Films ◽  
Pressure Chemical ◽  
Doped Zno

Ethanol-enriched low-pressure chemical vapor deposition ZnO bilayers: Properties and growth—A potential electrode for thin film solar cells

2013 ◽  
Vol 113 (2) ◽  
pp. 024908 ◽  
Author(s):  
Daniel Messerschmidt ◽  
Sylvain Nicolay ◽  
Laura Ding ◽  
Gregory Bugnon ◽  
Fanny Meillaud ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Thin Film Solar Cells ◽  
Potential Electrode ◽  
Pressure Chemical

Fabrications of Si Thin-Film Solar Cells by Hot-Wire Chemical Vapor Deposition and Laser Doping Techniques

2006 ◽  
Vol 45 (4B) ◽  
pp. 3516-3518 ◽  
Author(s):  
Shui-Yang Lien ◽  
Dong-Sing Wuu ◽  
Hsin-Yuan Mao ◽  
Bing-Rui Wu ◽  
Yen-Chia Lin ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thin Film Solar Cells ◽  
Hot Wire ◽  
Laser Doping ◽  
Si Thin Film

scholarly journals Silicon nitride anti-reflection coatings for CdS/CuInSe2 thin film solar cells by electron beam assisted chemical vapor deposition

Solar Cells ◽  
1985 ◽  
Vol 14 (3) ◽  
pp. 289-291 ◽  
Author(s):  
B.J. Stanbery ◽  
W.S. Chen ◽  
R.A. Mickelsen ◽  
G.J. Collins ◽  
K.A. Emery ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thin Film Solar Cells ◽  
Cuinse2 Thin Film

Boron Doping Effects on the Electro-optical Properties of Zinc Oxide Thin Films Deposited by Low-Pressure Chemical Vapor Deposition Process

2006 ◽  
Vol 928 ◽  
Author(s):  
Jerome Steinhauser ◽  
Sylvie Faÿ ◽  
Romain Schlüchter ◽  
Seung Yeop Myong ◽  
Evelyne Vallat ◽  
...  
Keyword(s):  
Grain Size ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Free Carrier ◽  
Zno Films ◽  
Pressure Chemical ◽  
Doped Zno

ABSTRACTBoron-doped zinc oxide (ZnO) films deposited by Low-Pressure Chemical Vapor Deposition (LPCVD) technique are used as Transparent Conductive Oxide (TCO) to contact thin-film silicon solar cells. In this paper, the effect of boron introduced as dopant during ZnO formation is studied. These films are highly transparent in the visible range, whereas in the near infrared region their transmittance decreases with the increase of boron content due to free carrier absorption (FCA). A shifting of the fondamental band gap is also observed. The resistivity decreases of about one order of magnitude with the increase of the doping ratio ([B2H6]/[DEZ]) from 0 to 2. This resistivity drop is mainly due to an increase of the free carrier concentration. In low doped samples, Hall mobility increases with grain size, whereas it shows no grain size dependence in highly doped layers. This suggest that the scattering by grain-boundary is the main limiting factor for transport in low doped ZnO samples, whereas in highly doped ZnO films transport is controlled by the ionized impurity scattering within the grains.

scholarly journals Performance Improvement of Microcrystalline p-SiC/i-Si/n-Si Thin Film Solar Cells by Using Laser-Assisted Plasma Enhanced Chemical Vapor Deposition

2014 ◽  
Vol 2014 ◽  
pp. 1-5
Author(s):  
Hsin-Ying Lee ◽  
Ting-Chun Wang ◽  
Chun-Yen Tseng
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Laser Power ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Thin Film Solar Cells ◽  
Si Films ◽  
Si Thin Film

The microcrystalline p-SiC/i-Si/n-Si thin film solar cells treated with hydrogen plasma were fabricated at low temperature using a CO2laser-assisted plasma enhanced chemical vapor deposition (LAPECVD) system. According to the micro-Raman results, the i-Si films shifted from 482 cm−1to 512 cm−1as the assisting laser power increased from 0 W to 80 W, which indicated a gradual transformation from amorphous to crystalline Si. From X-ray diffraction (XRD) results, the microcrystalline i-Si films with (111), (220), and (311) diffraction were obtained. Compared with the Si-based thin film solar cells deposited without laser assistance, the short-circuit current density and the power conversion efficiency of the solar cells with assisting laser power of 80 W were improved from 14.38 mA/cm2to 18.16 mA/cm2and from 6.89% to 8.58%, respectively.

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