Effects of dopant (Al, Ga, and In) on the characteristics of ZnO thin films prepared by RF magnetron sputtering system
2010 ◽
Vol 10
(3)
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pp. S463-S467
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2010 ◽
Vol 10
(3)
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pp. S495-S498
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2018 ◽
Vol 43
(22)
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pp. 10301-10310
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2021 ◽
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2011 ◽
Vol 29
(5)
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pp. 051514
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