Well-defined (0001)-oriented aluminum nitride polycrystalline films on amorphous glass substrates deposited by ion plating with direct-current arc discharge

2019 ◽  
Vol 478 ◽  
pp. 998-1003 ◽  
Author(s):  
Junichi Nomoto ◽  
Tetsuo Tsuchiya ◽  
Tetsuya Yamamoto
Keyword(s):  
Aluminum Nitride ◽  
Direct Current ◽  
Arc Discharge ◽  
Polycrystalline Films ◽  
Ion Plating ◽  
Glass Substrates ◽  
Amorphous Glass

Highly (0001)-oriented Al-doped ZnO polycrystalline films on amorphous glass substrates

2016 ◽  
Vol 120 (12) ◽  
pp. 125302 ◽  
Author(s):  
Junichi Nomoto ◽  
Katsuhiko Inaba ◽  
Minoru Osada ◽  
Shintaro Kobayashi ◽  
Hisao Makino ◽  
...  
Keyword(s):  
Polycrystalline Films ◽  
Glass Substrates ◽  
Amorphous Glass ◽  
Doped Zno

scholarly journals Low resistivity Ga-doped ZnO thin films of less than 100nm thickness prepared by ion plating with direct current arc discharge

2007 ◽  
Vol 91 (5) ◽  
pp. 051915 ◽  
Author(s):  
Takahiro Yamada ◽  
Aki Miyake ◽  
Seiichi Kishimoto ◽  
Hisao Makino ◽  
Naoki Yamamoto ◽  
...  
Keyword(s):  
Thin Films ◽  
Direct Current ◽  
Arc Discharge ◽  
Zno Thin Films ◽  
Ion Plating ◽  
Low Resistivity ◽  
Doped Zno

Effect of thermal annealing on electrical properties of transparent conductive Ga-doped ZnO films prepared by ion-plating using direct-current arc discharge

2009 ◽  
Vol 517 (10) ◽  
pp. 3134-3137 ◽  
Author(s):  
Takahiro Yamada ◽  
Aki Miyake ◽  
Hisao Makino ◽  
Naoki Yamamoto ◽  
Tetsuya Yamamoto
Keyword(s):  
Electrical Properties ◽  
Thermal Annealing ◽  
Direct Current ◽  
Arc Discharge ◽  
Zno Films ◽  
Ion Plating ◽  
Doped Zno

scholarly journals Effect of nitrogen gas pressure and ionization current on deposition of aluminum nitride film by reactive ion plating.

1987 ◽  
Vol 38 (6) ◽  
pp. 228-233
Author(s):  
Saburou KUWANO ◽  
Masahiro SUGIYAMA ◽  
Yoshio SHIBUYA ◽  
Terunori OOTAKE ◽  
Takeo OKI
Keyword(s):  
Aluminum Nitride ◽  
Gas Pressure ◽  
Nitride Film ◽  
Nitrogen Gas ◽  
Ion Plating ◽  
Ionization Current

Effects of Two-Step DC Electrochemical Pretreatment of Fine Grinding WC-Co Tool Surface on Morphology and Quality of Diamond Coatings

2011 ◽  
Vol 337 ◽  
pp. 59-62
Author(s):  
Xiang Hui Zhang ◽  
Ling Wang ◽  
Jian Ping Long
Keyword(s):  
Surface Morphology ◽  
Direct Current ◽  
Arc Discharge ◽  
Etching Time ◽  
Diamond Coating ◽  
Diamond Coatings ◽  
Fine Grinding ◽  
Electrolytic Etching ◽  
Electrochemical Pretreatment

In the present investigation, diamond coating was deposited on fine grinding cemented carbide substrate by direct current arc discharge chemical vapor deposition. The effect of electrolytic etching time in the two-step electrochemical pretreatment process (firstly using electrolytic etching, and then using acid etching) on morphology and quality of the diamond coating were systemically studied. The surface morphology feature and quality of diamond coatings were characterized by means of Scanning Electron Microscope (SEM), laser Raman spectrometer respectively. The results showed that the electrolytic etching duration has distinctly effect on the quality and crystal features such as morphology, crystal type and grain size of diamond coating. It showed that as electrolytic current is direct current 3A, electrolytic etching time altering from 0.5 min to 7.5min, the surface morphology of diamond films gradually transition from microcrystalline cubic-octahedron to cauliflower type nanocluster, and further increase the electrolytic etching time, will lead to several negative effects on the quality and nucleation of the coatings which is not only retard the diamond nucleation, but also promote the formation of graphite.

Multiferroic properties of Bi1−xAxFeO3 polycrystalline films on glass substrates (A = Ca, Sr, Ba and x=0.05–0.15)

2016 ◽  
Vol 683 ◽  
pp. 427-432 ◽  
Author(s):  
H.W. Chang ◽  
F.T. Yuan ◽  
K.T. Tu ◽  
S.Y. Lin ◽  
C.R. Wang ◽  
...  
Keyword(s):  
Polycrystalline Films ◽  
Multiferroic Properties ◽  
Glass Substrates

Silicon- and aluminum-nitride films deposited by reactive low-voltage ion plating and reactive dc-magnetron sputtering

1994 ◽  
Author(s):  
G. W. Vogl ◽  
K. H. Monz ◽  
Quang D. Nguyen ◽  
Michael Huter ◽  
Eduard P. Rille ◽  
...  
Keyword(s):  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Low Voltage ◽  
Dc Magnetron Sputtering ◽  
Ion Plating

Controllable synthesis of carbon nanomaterials by direct current arc discharge from the inner wall of the chamber

Carbon ◽  
2019 ◽  
Vol 142 ◽  
pp. 278-284 ◽  
Author(s):  
Da Zhang ◽  
Kai Ye ◽  
Yaochun Yao ◽  
Feng Liang ◽  
Tao Qu ◽  
...  
Keyword(s):  
Direct Current ◽  
Carbon Nanomaterials ◽  
Arc Discharge ◽  
Controllable Synthesis
Sign in / Sign up

Export Citation Format

Share Document