Effects of rapid thermal annealing on the local environment, electronic structure and magnetic properties of Mn doped TiO 2 thin films

2018 ◽  
Vol 445 ◽  
pp. 287-297 ◽  
Author(s):  
Rezq Naji Aljawfi ◽  
Ankush Vij ◽  
K.H Chae ◽  
S. Dalela ◽  
P.A. Alvi ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Electronic Structure ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Local Environment ◽  
Mn Doped

Effect of Rapid Thermal Annealing on the Structural and Magnetic Properties of Nanostructured FePt Thin Films

2013 ◽  
Vol 829 ◽  
pp. 396-400
Author(s):  
Younes Jalalizadeh ◽  
Ali Ghasemi ◽  
Gholam Reza Gordani
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Hysteresis Loops ◽  
Rf Magnetron Sputtering ◽  
Phase Identification ◽  
Glass Substrates ◽  
Structural And Magnetic Properties ◽  
Fept Thin Films

The main goal of this study is to investigate the structural and magnetic properties of FePt thin film with respect to the annealing tempreture. The FePt thin films were deposited by RF magnetron sputtering on Corning glass substrates at a room temperature. The films were then post-annealed at the Range of 575-675°C for 20 s by rapid thermal annealing (RTA) at a high heating ramp rate of 100 °Cs. Phase identification of thin films was performed using X-ray diffraction (XRD). With employing SEM, the size and uniformity of grains were studied. Moreover magnetic properties of annealed thin films were evaluated using a vibrating sample magnetometer (VSM). XRD results showed that the ordered FePt structure is formed at 625°C. According to the hysteresis loops, maximum out-of-plane and in-plane coercivity reached 7kOe. this value was achieve at 675°C .These results reveal its significant potential as magnetic recording media for high-density recording.

Effect of electron beam rapid thermal annealing on crystallographic, structural and magnetic properties of Zn 1−x Sm x O thin films

2015 ◽  
Vol 378 ◽  
pp. 112-117 ◽  
Author(s):  
Anuraj Sundararaj ◽  
Gopalakrishnan Chandrasekaran ◽  
Helen Annal Therese ◽  
Arumugam Sonachalam ◽  
Karthigeyan Annamalai
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Electron Beam ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Structural And Magnetic Properties

L10 Ordering of FePt Thin Films by Rapid Thermal Annealing

2003 ◽  
Vol 27 (11) ◽  
pp. 1083-1086 ◽  
Author(s):  
H. Ito ◽  
T. Kusunoki ◽  
H. Saito ◽  
S. Ishio
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Fept Thin Films

Effect of rapid thermal annealing on sprayed Cu2SnS3 thin films for solar-cell application

2020 ◽  
Vol 59 (10) ◽  
pp. 105503
Author(s):  
Wafaa Magdy ◽  
Ayaka Kanai ◽  
F. A. Mahmoud ◽  
E. T. El Shenawy ◽  
S. A. Khairy ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Solar Cell Application

Rapid Thermal Annealing Effects in CdTe (111) Thin Films Grown on GaAs (100) Substrates

1996 ◽  
Vol 35 (Part 1, No. 8) ◽  
pp. 4220-4224 ◽  
Author(s):  
M. D. Kim ◽  
T. W. Kang ◽  
M. S. Han ◽  
T. W. Kim
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Annealing Effects

Rapid Thermal Transformation of A-15 Crystal Structure Metallic Thin Films

1995 ◽  
Vol 387 ◽  
Author(s):  
M. J. O'Keefe ◽  
C. L. Cerny
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Physical Vapor Deposition ◽  
Thermal Transformation ◽  
The Body ◽  
Cubic Phase ◽  
Body Centered Cubic ◽  
Body Center Cubic

AbstractPhysical vapor deposition of Group VI elements (Cr, Mo, W) can lead to the formation of a metastable A-15 crystal structure under certain processing conditions. Typically, a thermally induced transformation of the metastable A-15 structure into the equilibrium body centered cubic structure has been accomplished by conventional furnace annealing at T/Tm ≈ 0.3 from tens of minutes to several hours. In this study we report on the use of rapid thermal annealing to transform sputter deposited A- 15 crystal structure tungsten and chromium thin films into body centered cubic films within the same temperature range but at times on the order of one minute. The minimum annealing times and temperatures required for complete transformation of the A-15 phase into the BCC phase varied from sample to sample, indicating that the transformation was dependent on the film characteristics. The electrical resistivity of A-15 Cr and W films was measured before and after rapid thermal annealing and was found to significantly decrease after transformation into the body center cubic phase.

STRUCTURAL CHARACTERISTICS OF (Ba,Sr)TiO3 THIN FILMS BY RAPID THERMAL ANNEALING

2007 ◽  
Vol 14 (01) ◽  
pp. 141-145
Author(s):  
Q. Y. ZHANG ◽  
S. W. JIANG ◽  
Y. R. LI
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Heating Rate ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Rapid Heating ◽  
Structural Characteristics ◽  
High Heating Rate ◽  
Duration Time ◽  
Temperature Heating

The rapid thermal annealing (RTA) process was adapted to crystallize the amorphous ( Ba,Sr ) TiO 3 thin films prepared on Si (111) substrates by RF magnetic sputtering deposition. The effect of annealing temperature, heating rate and duration time on crystallization was studied through X-ray diffraction and atomic force microscopy. The result shows that the crystallinity and grain size were strongly dependent on the temperature, heating rate, and duration time. Higher heating rate leads to smaller grain size. In high heating rate, the grain size shows different dependence of temperature from that of low heating rate. For a heating rate of 50°C/s, the grain size decreased with temperature increasing below 700°C, while after that temperature, the grain size increased slightly with the temperature increasing. At a certain temperature, the crystallinity and surface roughness improved with increase in annealing time, while grain size changed little. The effect of rapid heating rate on the nucleation and grain growth has been discussed, which contributes to the limited grain size of the annealed ( Ba,Sr ) TiO 3 thin films.

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