Effect of sputtering power on structural, cationic distribution and optical properties of Mn2Zn0.25Ni0.75O4 thin films

2018 ◽  
Vol 435 ◽  
pp. 815-821 ◽  
Author(s):  
Xiaobo Zhang ◽  
Wei Ren ◽  
Wenwen Kong ◽  
Qing Zhou ◽  
Lei Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Sputtering Power ◽  
Cationic Distribution

ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS PREPARED BY R.F. MAGNETRON SPUTTERING

2011 ◽  
Vol 25 (20) ◽  
pp. 2741-2749 ◽  
Author(s):  
J. C. ZHOU ◽  
L. LI ◽  
L. Y. RONG ◽  
B. X. ZHAO ◽  
Y. M. CHEN ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Electrical And Optical Properties ◽  
Axis Orientation ◽  
Sputtering Power

High transparency and conductivity of transparent conducting oxide thin film are very important for improving the efficiency of solar cells. ZnO thin film is a better candidate for transparent conductive layer of solar cell. N-type ZnO thin films were prepared by radio-frequency magnetron sputtering on glass substrates. ZnO thin films underwent annealing treatment after deposition. The influence of the sputtering power on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV2450 and HMS-3000. The experimental results indicate that the crystal quality of ZnO thin film is improved and all films show higher c-axis orientation with increasing sputtering power from 50 to 125 W. The average transparency of ZnO thin films is higher than 90% in the range of 400–900 nm between the sputtering power of 50–100 W. After the rapid thermal annealing at 550°C for 300 s under N2 ambient, the minimum resistivity reach to 10-2Ω⋅ cm .

The influence of sputtering power on the structural, morphological and optical properties of β-Ga2O3 thin films

2018 ◽  
Vol 753 ◽  
pp. 186-191 ◽  
Author(s):  
Shaofang Li ◽  
Shujie Jiao ◽  
Dongbo Wang ◽  
Shiyong Gao ◽  
Jinzhong Wang
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Sputtering Power

scholarly journals Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 106 ◽  
Author(s):  
Artur Wiatrowski ◽  
Agata Obstarczyk ◽  
Michał Mazur ◽  
Danuta Kaczmarek ◽  
Damian Wojcieszak
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Elastic Modulus ◽  
Magnetron Sputtering ◽  
Nanocrystalline Structure ◽  
Hafnium Dioxide ◽  
Simultaneous Increase ◽  
Water Contact ◽  
Sputtering Power ◽  
Crystallite Sizes

The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO2) thin films. Microstructure observations show that an increase in the sputtering power has a significant influence on HfO2 films’ microstructure. As-deposited hafnia thin films exhibit nanocrystalline structure with a monoclinic phase, however thr rise of the sputtering power results in an increase of crystallite sizes. Atomic force microscopy investigations show that the surface of the deposited films is smooth, crack-free, and composed of visible grains. The surface roughness and the value of the water contact angle increase with the increase of the sputtering power. Measurements of the optical properties show that HfO2 coatings are transparent in the visible wavelength range. A higher sputtering power causes a decrease of an average transmittance level and a simultaneous increase of the real part of the refractive index. Nanoindentation measurements reveal that the thin film hardness and Young’s elastic modulus increase with an increase in the sputtering power. Moreover, the results of plasticity index H/E and plastic resistance parameter H3/E2 are discussed. Based on the obtained results, a correlation between the sputtering power and the structural, surface, and optical properties, as well as the hardness and Young’s elastic modulus, were determined.

Sign in / Sign up

Export Citation Format

Share Document