Control of interfacial layer growth during deposition of high-κ oxide thin films in reactive RF-sputtering system
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2014 ◽
Vol 40
(7)
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pp. 9809-9816
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2015 ◽
Vol 75
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pp. 012023
2016 ◽
Vol 26
(4)
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pp. 889-894
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2015 ◽
Vol 85
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pp. 321-330
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2012 ◽
Vol 47
(10)
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pp. 2994-2998
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1999 ◽
Vol 44
(18)
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pp. 3085-3092
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