Electrodeposited non-stoichiometric tungstic acid for electrochromic applications: film growth modes, crystal structure, redox behavior and stability

2016 ◽  
Vol 388 ◽  
pp. 786-793 ◽  
Author(s):  
Leonid V. Pugolovkin ◽  
Olga V. Cherstiouk ◽  
Lyudmila M. Plyasova ◽  
Irina Yu. Molina ◽  
Tatyana Yu. Kardash ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Film Growth ◽  
Tungstic Acid ◽  
Redox Behavior ◽  
Growth Modes

Preparation of Large Area Cross-Sectional Tem Specimen of Semiconducting Heteroepitaxial Materials

1991 ◽  
Vol 254 ◽  
Author(s):  
M. Tamura ◽  
S. Aoki
Keyword(s):  
Sample Preparation ◽  
Film Growth ◽  
General Information ◽  
One Dimension ◽  
Main Principle ◽  
Large Area ◽  
Cross Sectional ◽  
Growth Modes ◽  
Present Technique ◽  
Grinding And Polishing

AbstractThe sample preparation procedures which enable us to observe large areas over a few tens of microns in one-dimension of semiconducting heteroepitaxial materials are described. The main principle involves the careful grinding and polishing of samples. In these procedures, another side thinning of the specimen after finishing initial side polishing is carried out using a sample platform by hand throughout all of the following steps. It is shown that for some typical examples of heteroepitaxial films general information concerning the film growth modes and structures, as well as the defect morphologies and natures introduced during growth can be effectively obtained by using the present technique.

Models of Thin Film Growth Modes

JOM ◽  
1987 ◽  
Vol 39 (6) ◽  
pp. 19-23 ◽  
Author(s):  
George H. Gilmer ◽  
Marcia H. Grabow
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Modes

A Numerical Study of Stress Controlled Surface Diffusion During Epitaxial Film Growth

1994 ◽  
Vol 356 ◽  
Author(s):  
Cheng-Hsin Chiu ◽  
Huajian Gao
Keyword(s):  
Surface Diffusion ◽  
Film Growth ◽  
Numerical Study ◽  
Morphological Evolution ◽  
Film Surface ◽  
Numerical Results ◽  
Simultaneous Action ◽  
Surface Evolution ◽  
Growth Modes ◽  
Film Substrate

AbstractA two-dimensional numerical simulation is performed to model the morphological evolution of a strained film growing heteroepitaxially on a substrate under simultaneous action of vapor deposition and surface diffusion. To facilitate numerical implementation, a continuum boundary layer model is proposed to account for the influence of film/substrate interface on the film growth pattern. Discussions are focused on the Stranski-Krastanow growth mode, although our model is capable of explaining Frank-van der Merwe and Volmer-Weber growth modes as well. Both first-order perturbation and numerical results are developed to demonstrate that the film surface tends to remain flat during the initial stage of growth and that surface roughening occurs once the film thickness exceeds a critical value, in consistency with experimentally observed patterns of S-K growth. Numerical results further show that, depending on the deposition rate, the surface evolution could lead to a steady state morphology, unstable cusp formation, or growing islands with flattened valleys.

Evolution of surface structure, microstructure, and superconducting properties during YBa2Cu3O7a-axis thin film growth

1998 ◽  
Vol 13 (3) ◽  
pp. 551-556
Author(s):  
A. F. Marshall
Keyword(s):  
Thin Film ◽  
Grain Size ◽  
Surface Structure ◽  
Film Growth ◽  
Bimodal Distribution ◽  
Thin Film Growth ◽  
Grain Structure ◽  
Superconducting Transition ◽  
Superconducting Properties ◽  
Growth Modes

The evolution of surface structure, grain microstructure, and superconducting transition temperature of a-axis YBa2Cu3O7 thin films has been studied as a function of film thickness. The grain size increases and develops a bimodal distribution of grain size during film growth, concurrent with an improvement in Tc. The surface structure does not represent the grain size, but rather the development of the bimodal grain structure follows the formation of the surface structure. The results are discussed in terms of thin film growth modes.

Thin Film Growth

1987 ◽  
Vol 103 ◽  
Author(s):  
R. W. Vook
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Mode ◽  
Growth Modes ◽  
Epitaxial Multilayers ◽  
Theoretical Results

ABSTRACTA review of the experimental and theoretical results describing thin film growth modes is presented. Thermodynamic criteria for determining which growth mode might be expected to occur in a particular case along with some kinetic considerations are given. The characteristics of each of the three principal growth modes, namely Frank and van der Merwe (layer), Stranski-Krastanov (layer plus island), and Volmer-Weber (island), are discussed. Lastly, the requirements favoring the growth of epitaxial multilayers are briefly considered.

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