Electrochromic properties and performance of NiOx films and their corresponding all-thin-film flexible devices preparedby reactive DC magnetron sputtering

2016 ◽  
Vol 383 ◽  
pp. 49-56 ◽  
Author(s):  
Dongmei Dong ◽  
Wenwen Wang ◽  
Guobo Dong ◽  
Fan Zhang ◽  
Yingchun He ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Electrochromic Properties ◽  
Flexible Devices ◽  
And Performance

Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

2018 ◽  
Vol 5 (1) ◽  
pp. 2696-2704 ◽  
Author(s):  
M. Muralidhar Singh ◽  
G. Vijaya ◽  
M.S. Krupashankara ◽  
B.K. Sridhara ◽  
T.N. Shridhar
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Film Coatings ◽  
Thin Film Coatings

Electrochromic Properties of NiOx Films Deposited by DC Magnetron Sputtering

2018 ◽  
Vol 18 (6) ◽  
pp. 4222-4229 ◽  
Author(s):  
Jianhua Qiu ◽  
Zhao Chen ◽  
Tianxiang Zhao ◽  
Zhihui Chen ◽  
Wenjing Chu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Electrochromic Properties

Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6466-6471 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Zno Thin Film ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Sputtering Power ◽  
Doped Zno ◽  
Pulsed Dc Magnetron Sputtering

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

scholarly journals Studies on Nanostructure Aluminium Thin Film Coatings Deposited using DC magnetron Sputtering Process

2016 ◽  
Vol 149 ◽  
pp. 012071 ◽  
Author(s):  
Muralidhar Singh M ◽  
Vijaya G ◽  
Krupashankara MS ◽  
B K Sridhara ◽  
T N Shridhar
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Film Coatings ◽  
Thin Film Coatings

Fabrication and Electrical Properties of Highly Preferred Orientation Mo Thin Film by DC Magnetron Sputtering

2011 ◽  
Vol 40 (9) ◽  
pp. 1342-1345
Author(s):  
王震东 王震东 ◽  
赖珍荃 赖珍荃 ◽  
范定环 范定环 ◽  
徐鹏 徐鹏
Keyword(s):  
Thin Film ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Preferred Orientation ◽  
Dc Magnetron Sputtering

Photocatalytic efficiency of TiO2/SnO2 thin film stacks prepared by DC magnetron sputtering

Vacuum ◽  
2004 ◽  
Vol 74 (3-4) ◽  
pp. 723-727 ◽  
Author(s):  
N. Kanai ◽  
T. Nuida ◽  
K. Ueta ◽  
K. Hashimoto ◽  
T. Watanabe ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Sno2 Thin Film ◽  
Photocatalytic Efficiency ◽  
Dc Magnetron Sputtering

Growth Spindle-Like ZnO Nanocrystalline Thin Films on Nickel Layers by Dc Magnetron Sputtering and its Thermal Annealing Properties

2011 ◽  
Vol 675-677 ◽  
pp. 1097-1100
Author(s):  
W. Wu ◽  
X.H. Xiao ◽  
T.C. Peng ◽  
C.Z. Jiang
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Structural Features ◽  
Optical Quality ◽  
Zno Films ◽  
Near Band Edge ◽  
Band Edge Emission ◽  
Dc Magnetron Sputtering ◽  
Band Emission ◽  
Thin Film Layer

A novel spindle-like zinc oxide (ZnO) nanocrystalline thin film was successfully fabricated on Ni thin film layer by ultrahigh-vacuum dc magnetron sputtering. Then the as-grown films were annealed in air at various temperatures from 673 to 1073 K, the corresponding structural features and surface morphology were studied by X-ray diffraction (XRD) and field emission scanning electronic microscopy (FE-SEM). The results reveal that the dominant direction of grains movement changed from perpendicular to parallel to the film interfaces. A correlation of the band gap and photoluminescence (PL) properties of nanocrystalline ZnO films with particle size morphologies and strain was discussed. Especially, PL emission in UV range, which is due to near band edge emission is more intense in comparison with the green band emission (due to defect state) was observed in all samples, indicating a good optical quality of the deposited films.

Protection Effect of ZrO2 Coating Layer on LiCoO2 Thin Film Fabricated by DC Magnetron Sputtering

2013 ◽  
Vol 13 (10) ◽  
pp. 7152-7154 ◽  
Author(s):  
Jung-Pil Noh ◽  
Ki-Taek Jung ◽  
Min-Sun Jang ◽  
Tae-Hoon Kwon ◽  
Gyu-Bong Cho ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Coating Layer ◽  
Dc Magnetron Sputtering ◽  
Protection Effect
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