Enhanced TiC/SiC Ohmic contacts by ECR hydrogen plasma pretreatment and low-temperature post-annealing

2015 ◽  
Vol 355 ◽  
pp. 59-63 ◽  
Author(s):  
Bingbing Liu ◽  
Fuwen Qin ◽  
Dejun Wang
Keyword(s):  
Low Temperature ◽  
Ohmic Contacts ◽  
Hydrogen Plasma ◽  
Post Annealing ◽  
Plasma Pretreatment

Effects of hydrogen plasma pretreatment on characteristics of copper film deposited by remote plasma CVD using (hfac)Cu(TMVS)

2000 ◽  
Vol 375 (1-2) ◽  
pp. 132-136 ◽  
Author(s):  
Jong-Hyun Lee ◽  
Jeong-Hwan Lee ◽  
Ki-Ju Hwang ◽  
Jung-Yeul Kim ◽  
Chang-Gil Suk ◽  
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Hydrogen Plasma ◽  
Copper Film ◽  
Plasma Cvd ◽  
Remote Plasma ◽  
Plasma Pretreatment

scholarly journals High performance ultraviolet photodetectors with atomic-layer-deposited ZnO films via low-temperature post-annealing in air

AIP Advances ◽  
2018 ◽  
Vol 8 (1) ◽  
pp. 015015 ◽  
Author(s):  
Jian Gao ◽  
Wen-Jun Liu ◽  
Shi-Jin Ding ◽  
Hong-Liang Lu ◽  
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Low Temperature ◽  
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Atomic Layer ◽  
Zno Films ◽  
Post Annealing ◽  
Ultraviolet Photodetectors

Low temperature Cu/Ti/Al Ohmic contacts to p-type 4H-SiC

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Author(s):  
Fei Cao ◽  
Yang-xi Xu ◽  
Jin-chi Sui ◽  
Xing-ji Li ◽  
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Keyword(s):  
Low Temperature ◽  
Ohmic Contacts ◽  
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Low-Temperature Doping of P-Type Czochralski Silicon due to Hydrogen Plasma Enhanced Thermal Donor Formation

1997 ◽  
Vol 57-58 ◽  
pp. 189-196 ◽  
Author(s):  
Alexander G. Ulyashin ◽  
Yu.A. Bumay ◽  
Reinhart Job ◽  
G. Grabosch ◽  
D. Borchert ◽  
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Keyword(s):  
Low Temperature ◽  
Hydrogen Plasma ◽  
Czochralski Silicon ◽  
Thermal Donor ◽  
Donor Formation ◽  
P Type
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