An iron(II) diketonate–diamine complex as precursor for thin film fabrication by atomic layer deposition

2015 ◽  
Vol 347 ◽  
pp. 861-867 ◽  
Author(s):  
Jon E. Bratvold ◽  
Giorgio Carraro ◽  
Davide Barreca ◽  
Ola Nilsen
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Thin Film Fabrication ◽  
Layer Deposition ◽  
Film Fabrication

scholarly journals Thin film fabrication and characterization of proton conducting lanthanum tungstate

2014 ◽  
Vol 2 (43) ◽  
pp. 18463-18471 ◽  
Author(s):  
Kristin Bergum ◽  
Anna Magrasó ◽  
Helmer Fjellvåg ◽  
Ola Nilsen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Impedance Spectroscopy ◽  
Atomic Layer ◽  
Proton Conducting ◽  
Thin Film Fabrication ◽  
Layer Deposition ◽  
Film Fabrication ◽  
Fabrication And Characterization

Thin films of the proton conducting lanthanum tungstate phase, La28−xW4+xO54+δv2−δ, were fabricated by atomic layer deposition (ALD) and characterized by impedance spectroscopy.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

2013 ◽  
Vol 542 ◽  
pp. 219-224 ◽  
Author(s):  
Väino Sammelselg ◽  
Ivan Netšipailo ◽  
Aleks Aidla ◽  
Aivar Tarre ◽  
Lauri Aarik ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Chemical Resistance ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition

2014 ◽  
Vol 64 (9) ◽  
pp. 15-21 ◽  
Author(s):  
G. Y. Cho ◽  
S. Noh ◽  
Y. H. Lee ◽  
S. Ji ◽  
S. W. Cha
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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