High precision patterning of ITO using femtosecond laser annealing process

2014 ◽  
Vol 314 ◽  
pp. 215-220 ◽  
Author(s):  
Chung-Wei Cheng ◽  
Cen-Ying Lin
Keyword(s):  
Femtosecond Laser ◽  
High Precision ◽  
Laser Annealing ◽  
Annealing Process

High-precision Method of Machining Taper Holes of Diesel Engine Nozzle with Femtosecond Laser

2014 ◽  
Vol 43 (4) ◽  
pp. 414003
Author(s):  
王锋 WANG Feng ◽  
罗建军 LUO Jian-jun ◽  
李明 LI Ming
Keyword(s):  
Diesel Engine ◽  
Femtosecond Laser ◽  
High Precision ◽  
Precision Method

scholarly journals Morphological and electrical properties of Nickel based Ohmic contacts formed by laser annealing process on n-type 4H-SiC

2019 ◽  
Vol 97 ◽  
pp. 62-66 ◽  
Author(s):  
S. Rascunà ◽  
P. Badalà ◽  
C. Tringali ◽  
C. Bongiorno ◽  
E. Smecca ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Ohmic Contacts ◽  
Laser Annealing ◽  
Annealing Process

Aligned, Coexisting Liquid and Solid Regions in Pulsed and CW Laser Annealing of Si

1982 ◽  
Vol 13 ◽  
Author(s):  
R. J. Nemanich ◽  
D. K. Biegelsen ◽  
W. G. Hawkins
Keyword(s):  
Surface Topography ◽  
Crystallization Process ◽  
Laser Annealing ◽  
Annealing Process ◽  
Temperature Evolution ◽  
Lattice Temperature ◽  
Cw Laser ◽  
Si Films ◽  
Quartz Substrates

ABSTRACTAligned, coexisting liquid and solid regions are observed in cw laser annealing of polycrystalline Si films on quartz substrates. These stripe patterns are the precursors of surface topography that exists after cooling. It is proposed that a similar situation exists in the pulse annealing process. A calculation of the temperature evolution which assumes stripe symmetry and kinetic restraints of the crystallization process has been carried out. These calculations indicate a lattice temperature of between 1100 and 1300 K, 10 nsec after the sample has fully solidified.

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