60 keV Ar+-ion induced pattern formation on Si surface: Roles of sputter erosion and atomic redistribution

2014 ◽  
Vol 310 ◽  
pp. 147-153 ◽  
Author(s):  
S.K. Garg ◽  
D.P. Datta ◽  
M. Kumar ◽  
D. Kanjilal ◽  
T. Som
Keyword(s):  
Pattern Formation ◽  
Sputter Erosion

The effect of redeposition on the ion flux dependence of Si dot pattern formation during ion sputter erosion

2006 ◽  
Vol 18 (13) ◽  
pp. 3367-3375 ◽  
Author(s):  
Wen-bin Fan ◽  
Li Ling ◽  
Le-jun Qi ◽  
Wei-qing Li ◽  
Hai-tong Sun ◽  
...  
Keyword(s):  
Pattern Formation ◽  
Ion Flux ◽  
Sputter Erosion

Pattern formation of Si surfaces by low-energy sputter erosion

2007 ◽  
Vol 201 (19-20) ◽  
pp. 8299-8302 ◽  
Author(s):  
K. Zhang ◽  
F. Rotter ◽  
M. Uhrmacher ◽  
C. Ronning ◽  
H. Hofsäss ◽  
...  
Keyword(s):  
Pattern Formation ◽  
Low Energy ◽  
Sputter Erosion

Pattern formation in the splay Freedericks transition of a nematic side-group polysiloxane

1993 ◽  
Vol 3 (6) ◽  
pp. 865-889 ◽  
Author(s):  
Norbert Schwenk ◽  
Hans Wolfgang Spiess
Keyword(s):  
Pattern Formation ◽  
Side Group

Pattern Formation in Thin Polymer Films: A New Morphology

2000 ◽  
Vol 629 ◽  
Author(s):  
Jean-Loup Masson ◽  
Peter F. Green
Keyword(s):  
Growth Rate ◽  
Pattern Formation ◽  
Early Stage ◽  
Structural Evolution ◽  
Distinct Form ◽  
Thin Polymer Films ◽  
Intermediate Morphology ◽  
Thin Polymer ◽  
Nonwetting Liquid ◽  
Cylindrical Holes

ABSTRACTResearchers have shown that thin, nonwetting, liquid homopolymer films dewet substrates, forming patterns that reflect fluctuations in the local film thickness. These patterns have been shown to be either discrete cylindrical holes or bicontinuous “spinodal-like” patterns. In this paper we show the existence of a new morphology. During the early stage of dewetting, discrete highly asymmetric holes appear spontaneously throughout the film. The nucleation rate of these holes is faster than their growth rate. The morphology of the late stage of evolution, after 18 days, is characterized by a bicontinuous pattern, distinct form conventional spinodal dewetting patterns. This morphology has been observed for a range of film thicknesses between 7.5 and 21nm. The structural evolution of this intermediate morphology is discussed.

Pattern Formation Survey on Non Uniformly Forced Swift-Hohenberg Equation

2019 ◽  
Author(s):  
Daniel Coelho ◽  
José da Rocha Miranda Pontes ◽  
Norberto Mangiavacchi
Keyword(s):  
Pattern Formation
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