Roughness scaling in titanium thin films: A three-dimensional molecular dynamics study of rotational and static glancing angle deposition

2013 ◽  
Vol 268 ◽  
pp. 270-273 ◽  
Author(s):  
Matilda Backholm ◽  
Morten Foss ◽  
Kai Nordlund
Keyword(s):  
Thin Films ◽  
Molecular Dynamics ◽  
Three Dimensional ◽  
Glancing Angle Deposition ◽  
Glancing Angle ◽  
Titanium Thin Films ◽  
Angle Deposition

Simulation of 3D Films Deposited by Glancing Angle Deposition Using 3D-Films

2000 ◽  
Vol 616 ◽  
Author(s):  
T. Smy ◽  
D. Vick ◽  
M. J. Brett ◽  
S. K. Dew ◽  
A. T. Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Three Dimensional ◽  
Thin Film Deposition ◽  
Glancing Angle Deposition ◽  
Film Deposition ◽  
Porous Thin Films ◽  
Glancing Angle ◽  
Memory Resources ◽  
Angle Deposition

AbstractA new fully three dimensional (3D) ballistic deposition simulator 3D-FILMS has been developed for the modeling of thin film deposition and structure. The simulator may be implemented using the memory resources available to workstations. In order to illustrate the capabilities of 3D-FILMS, we apply it to the growth of engineered porous thin films produced by the technique of GLancing Angle Deposition (GLAD).

Thin Film Microstructure Control Using Glancing Angle Deposition by Sputtering

1999 ◽  
Vol 14 (4) ◽  
pp. 1197-1199 ◽  
Author(s):  
J. C. Sit ◽  
D. Vick ◽  
K. Robbie ◽  
M. J. Brett
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Incidence Angle ◽  
Porous Titanium ◽  
Glancing Angle Deposition ◽  
Nanometer Scale ◽  
Glancing Angle ◽  
Deposition By Sputtering ◽  
Titanium Thin Films ◽  
Angle Deposition

Thin films with microstructures controlled on a nanometer scale have been fabricated using a recently developed process called glancing angle deposition (GLAD) which combines oblique angle evaporation with controlled substrate motion. Critical to the production of GLAD thin films is the requirement for a narrow angular flux distribution centered at an oblique incidence angle. We report here recent work with low-pressure, long-throw sputter deposition with which we have succeeded in fabricating porous titanium thin films possessing “zig-zag,” helical, and “pillar” microstructures, demonstrating microstructural control on a level consistent with evaporated GLAD. The use of sputtering for GLAD simplifies process control and should enable deposition of a broader range of thin film materials.

scholarly journals METAL-TO-DIELECTRIC TRANSITION INDUCED BY ANNEALING OF ORIENTED TITANIUM THIN FILMS

2013 ◽  
Vol 06 (01) ◽  
pp. 1250051 ◽  
Author(s):  
AURÉLIEN BESNARD ◽  
NICOLAS MARTIN ◽  
FABRICE STHAL ◽  
LUC CARPENTIER ◽  
JEAN-YVES RAUCH
Keyword(s):  
Thin Films ◽  
Incident Angle ◽  
Annealing Treatment ◽  
Glancing Angle Deposition ◽  
Gradual Transition ◽  
Dc Magnetron Sputtering ◽  
Glancing Angle ◽  
Titanium Thin Films ◽  
Angle Deposition ◽  
Dielectric Transition

Titanium thin films were deposited by DC magnetron sputtering. The glancing angle deposition (GLAD) method was implemented to prepare two series of titanium films: perpendicular and oriented columnar structures. The first series was obtained with a conventional incident angle α of the sputtered particles (α = 0°), whereas the second one used a grazing incident angle α = 85°. Afterwards, the films were annealed in air using six cycles of temperature ranging from 293 K to 773 K. DC electrical conductivity was measured during the annealing treatment. Films deposited by conventional sputtering (α = 0°) kept a typical metallic-like behavior versus temperature (σ300 K = 2.0 × 106 S m-1 and TCR293 K = 1.52 × 10-3 K-1), whereas those sputtered with α = 85° showed a gradual transition from metal to dielectric. Such a transition was mainly attributed to the high porous structure, which favors the oxidation of titanium films to tend to the TiO2 compound.

Ultrahigh vacuum glancing angle deposition system for thin films with controlled three-dimensional nanoscale structure

2004 ◽  
Vol 75 (4) ◽  
pp. 1089-1097 ◽  
Author(s):  
Kevin Robbie ◽  
Gisia Beydaghyan ◽  
Tim Brown ◽  
Cory Dean ◽  
Jonathan Adams ◽  
...  
Keyword(s):  
Thin Films ◽  
Three Dimensional ◽  
Ultrahigh Vacuum ◽  
Glancing Angle Deposition ◽  
Glancing Angle ◽  
Nanoscale Structure ◽  
Angle Deposition

scholarly journals Microstructure-Induced Anisotropic Optical Properties of YF3 Columnar Thin Films Prepared by Glancing Angle Deposition

Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2413
Author(s):  
Yao Shan ◽  
Pian Liu ◽  
Yao Chen ◽  
Haotian Zhang ◽  
Huatian Tu ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Volume Fraction ◽  
Electron Beam Evaporation ◽  
Glancing Angle Deposition ◽  
Refractive Indices ◽  
Glancing Angle ◽  
Axis Parallel ◽  
Angle Deposition ◽  
Deposition Angle

Yttrium fluoride (YF3) columnar thin films (CTFs) were fabricated by electron beam evaporation with the glancing angle deposition method. The microstructures and optical properties of YF3 CTFs were studied systematically. The YF3 films grown at different deposition angles are all amorphous. As the deposition angle increases, the columns in YF3 CTFs become increasingly separated and inclined, and the volume fraction of YF3 decreases, resulting in lower refractive indices. This phenomenon is attributed to the self-shadowing effect and limited adatom diffusion. The YF3 CTFs are optically biaxial anisotropic with the long axis (c-axis) parallel to the columns, the short axis (b-axis) perpendicular to the columns, and the other axis (a-axis) parallel to the film interface. The principal refractive index along the b-axis for the 82°-deposited sample is approximately 1.233 at 550 nm. For the 78°-deposited sample, the differences of principal refractive indices between the c-axis and the b-axis and between the a-axis and the b-axis reach the maximum 0.056 and 0.029, respectively. The differences of principal refractive indices were affected by both the deposition angle and the volume fraction of YF3.

Anisotropic Co-Hf Thin Films for Micro-Sensors and Micro-Transducers

2015 ◽  
Vol 644 ◽  
pp. 65-69
Author(s):  
V. Madurga ◽  
C. Favieres ◽  
J. Vergara
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Transverse Direction ◽  
Anisotropy Field ◽  
Transverse Magnetic ◽  
Glancing Angle Deposition ◽  
Maximum Value ◽  
Easy Direction ◽  
Glancing Angle ◽  
Angle Deposition

Thin films of Co-Hf (≈ 86-14 % at.) were grown over Si micro-cantilevers using a glancing-angle deposition technique. A controlled easy direction of magnetisation (anisotropy field μoHk ≈ 0.1 T) in the longitudinal or in the transverse direction of the micro-cantilevers was generated. The mechanical properties of the films under the action of a magnetic field were opposite depending on the magnetisation’s easy direction: i) their deflection was either zero or the maximum value depending on the direction of the applied magnetic field with respect to the parallel or transverse easy direction of magnetisation; ii) the shift in the resonance frequency under a longitudinal or transverse magnetic field was also different depending on the longitudinal or transverse easy direction of magnetisation. The use of these coated devices with micromagnet-like films for sensors and transducers is discussed.

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