Effect of interface layer on growth behavior of atomic-layer-deposited Ir thin film as novel Cu diffusion barrier

Bum Ho Choi; Jong Ho Lee; Hong Kee Lee; Joo Hyung Kim

doi:10.1016/j.apsusc.2011.06.093

Effect of interface layer on growth behavior of atomic-layer-deposited Ir thin film as novel Cu diffusion barrier

Applied Surface Science ◽

10.1016/j.apsusc.2011.06.093 ◽

2011 ◽

Vol 257 (22) ◽

pp. 9654-9660 ◽

Cited By ~ 10

Author(s):

Bum Ho Choi ◽

Jong Ho Lee ◽

Hong Kee Lee ◽

Joo Hyung Kim

Keyword(s):

Thin Film ◽

Diffusion Barrier ◽

Atomic Layer ◽

Interface Layer ◽

Growth Behavior ◽

Cu Diffusion Barrier

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Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.09.074 ◽

2012 ◽

Vol 211 ◽

pp. 14-17 ◽

Cited By ~ 4

Author(s):

Sang In Song ◽

Jong Ho Lee ◽

Bum Ho Choi ◽

Hong Kee Lee ◽

Dong Chan Shin ◽

...

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Hydrogen Plasma ◽

Atomic Layer ◽

Layer Deposition ◽

Cu Diffusion Barrier

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Substrate-Dependent Growth Behavior of Atomic-Layer-Deposited Zinc Oxide and Zinc Tin Oxide Thin Films for Thin-Film Transistor Applications

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.0c07800 ◽

2020 ◽

Vol 124 (49) ◽

pp. 26780-26792

Author(s):

Jun Shik Kim ◽

Younjin Jang ◽

Sukin Kang ◽

Yonghee Lee ◽

Kwangmin Kim ◽

...

Keyword(s):

Thin Film ◽

Thin Films ◽

Zinc Oxide ◽

Tin Oxide ◽

Thin Film Transistor ◽

Atomic Layer ◽

Growth Behavior ◽

Oxide Thin Films ◽

Zinc Tin Oxide ◽

Dependent Growth

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Atomic Layer Deposition of Ultrathin TaN and Ternary Ta1-XAlXNy Films for Cu Diffusion Barrier Applications in Advanced Interconnects

ECS Transactions ◽

10.1149/06907.0181ecst ◽

2015 ◽

Vol 69 (7) ◽

pp. 181-189 ◽

Cited By ~ 6

Author(s):

S. Consiglio ◽

K. Yu ◽

S. Dey ◽

K. Tapily ◽

R. D. Clark ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Atomic Layer ◽

Layer Deposition ◽

Cu Diffusion Barrier

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A Study on the Growth Behavior and Stability of Molecular Layer Deposited Alucone Films Using Diethylene Glycol and Trimethyl Aluminum Precursors, and the Enhancement of Diffusion Barrier Properties by Atomic Layer Deposited Al2O3 Capping

ACS Applied Materials & Interfaces ◽

10.1021/acsami.6b00762 ◽

2016 ◽

Vol 8 (19) ◽

pp. 12263-12271 ◽

Cited By ~ 23

Author(s):

Dong-won Choi ◽

Mi Yoo ◽

Hyuck Mo Lee ◽

Jozeph Park ◽

Hyun You Kim ◽

...

Keyword(s):

Diethylene Glycol ◽

Diffusion Barrier ◽

Molecular Layer ◽

Atomic Layer ◽

Barrier Properties ◽

Growth Behavior ◽

Trimethyl Aluminum ◽

Aluminum Precursors

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The Effect of Periodic Relaxation on the Growth Behavior and Electrical Properties of Atomic Layer Deposited PbTiO3 Thin Film

ECS Meeting Abstracts ◽

10.1149/ma2009-01/19/808 ◽

2009 ◽

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Atomic Layer ◽

Growth Behavior ◽

Pbtio3 Thin Film

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Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

Applied Surface Science ◽

10.1016/j.apsusc.2015.11.095 ◽

2016 ◽

Vol 362 ◽

pp. 176-181 ◽

Cited By ~ 6

Author(s):

Jeong Hwan Han ◽

Hyo Yeon Kim ◽

Sang Chan Lee ◽

Da Hye Kim ◽

Bo Keun Park ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Atomic Layer ◽

Tantalum Nitride ◽

Nitride Film ◽

Ethyl Methyl ◽

Layer Deposition ◽

Cu Diffusion Barrier

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Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2020.158314 ◽

2021 ◽

Vol 858 ◽

pp. 158314

Author(s):

Yong-Hwan Joo ◽

Dip K. Nandi ◽

Rahul Ramesh ◽

Yujin Jang ◽

Jong-Seong Bae ◽

...

Keyword(s):

Thin Films ◽

Diffusion Barrier ◽

Atomic Layer ◽

Cu Diffusion Barrier

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Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5002727 ◽

2018 ◽

Vol 36 (3) ◽

pp. 031502

Author(s):

Yong-Ping Wang ◽

Zi-Jun Ding ◽

Bao Zhu ◽

Wen-Jun Liu ◽

David Wei Zhang ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Atomic Layer ◽

Layer Deposition ◽

Cu Diffusion Barrier

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Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition

Microelectronic Engineering ◽

10.1016/j.mee.2009.11.163 ◽

2010 ◽

Vol 87 (5-8) ◽

pp. 1391-1395 ◽

Cited By ~ 22

Author(s):

Bum Ho Choi ◽

Yong Hwan Lim ◽

Jong Ho Lee ◽

Young Baek Kim ◽

Ho-Nyun Lee ◽

...

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Atomic Layer ◽

Layer Deposition ◽

Thin Film Layer ◽

Film Layer

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Initial Growth Behavior of a Lead Oxide Thin Film on Ir Substrates by Atomic Layer Deposition

Electrochemical and Solid-State Letters ◽

10.1149/1.2789286 ◽

2007 ◽

Vol 10 (12) ◽

pp. G89 ◽

Cited By ~ 4

Author(s):

Hyun Ju Lee ◽

Gun Hwan Kim ◽

Keun Lee ◽

Cheol Seong Hwang

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Lead Oxide ◽

Atomic Layer ◽

Growth Behavior ◽

Oxide Thin Film ◽

Initial Growth ◽

Layer Deposition

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