Theoretical analysis of fluorine-passivated germanium surface for high-k/Ge gate stack by molecular orbital method

2010 ◽  
Vol 257 (3) ◽  
pp. 917-920 ◽  
Author(s):  
DongHun Lee ◽  
Hyun Lee ◽  
Takeshi Kanashima ◽  
Masanori Okuyama
2006 ◽  
Vol 106 (15) ◽  
pp. 3270-3277 ◽  
Author(s):  
Kenichi Dedachi ◽  
Takayuki Natsume ◽  
Taisuke Nakatsu ◽  
Yasuyuki Ishikawa ◽  
Noriyuki Kurita

2000 ◽  
Vol 40 (supplement) ◽  
pp. S39
Author(s):  
N. Kamiya ◽  
K. Ohno ◽  
S. Nakajima ◽  
Y. Inoue ◽  
M. Sakurai

1996 ◽  
Vol 35 (Part 1, No. 2B) ◽  
pp. 1445-1449 ◽  
Author(s):  
Takeshi Kanashima ◽  
Masanori Okuyama ◽  
Yoshihiro Hamakawa

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