ZnS thin film deposited with chemical bath deposition process directed by different stirring speeds

2010 ◽  
Vol 256 (22) ◽  
pp. 6871-6875 ◽  
Author(s):  
Y. Zhang ◽  
X.Y. Dang ◽  
J. Jin ◽  
T. Yu ◽  
B.Z. Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Bath Deposition ◽  
Deposition Process

Growth Mechanism of thin Film Wide-Gap Semiconductors by Chemical Bath Deposition Technique

1999 ◽  
Vol 558 ◽  
Author(s):  
P. K. Nair ◽  
P. Parmananda ◽  
M. T. S. Nair
Keyword(s):  
Thin Film ◽  
Mathematical Model ◽  
Chemical Bath Deposition ◽  
Growth Mechanism ◽  
Dissociation Constants ◽  
Growth Curves ◽  
Deposition Process ◽  
Terminal Phase ◽  
Semiconductor Films ◽  
Complex Ions

ABSTRACTChemical bath deposition is a thin film technique in which semiconductor thin films of typically 0.02 – 1 μm thickness are deposited on substrates immersed in dilute baths containing metal ions and a source of sulfide or selenide ions. Many I–VI, II–VI, IV–VI, and V–VI semiconductors are included in the list of materials deposited by this technique, II–VI compounds CdS, CdSe, ZnS and ZnSe being the most investigated. However, a mathematical model describing the growth mechanism of these films still remains to be established. The deposition process consists of a nucleation phase, growth phase, and a terminal phase, each of which depends on the concentration of the ions in the deposition bath, its temperature, dissociation constants of the metal complex ions, etc. In this paper we propose a mathematical model, which can qualitatively account for most of the features of the experimental growth curves of chemically deposited semiconductor films.

scholarly journals Optical and Structural Characterization of Cd-Free Buffer Layers Fabricated by Chemical Bath Deposition

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 897
Author(s):  
William Vallejo ◽  
Carlos Diaz-Uribe ◽  
Cesar Quiñones
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Chemical Bath Deposition ◽  
Structural Characterization ◽  
Optical Transmittance ◽  
Deposition Process ◽  
Buffer Layers ◽  
Visible Range ◽  
Electromagnetic Spectrum ◽  
Distribution Diagram

Chemical bath deposition (CBD) is a suitable, inexpensive, and versatile synthesis technique to fabricate different semiconductors under soft conditions. In this study, we deposited Zn(O;OH)S thin films by the CBD method to analyze the effect of the number of thin film layers on structural and optical properties of buffer layers. Thin films were characterized by X-ray diffraction (XRD) and UV-Vis transmittance measurements. Furthermore, we simulated a species distribution diagram for Zn(O;OH)S film generation during the deposition process. The optical results showed that the number of layers determined the optical transmittance of buffer layers, and that the transmittance reduced from 90% (with one layer) to 50% (with four layers) at the visible range of the electromagnetic spectrum. The structural characterization indicated that the coatings were polycrystalline (α-ZnS and β-Zn(OH)2 to four layers). Our results suggest that Zn(O;OH)S thin films could be used as buffer layers to replace CdS thin films as an optical window in thin-film solar cells.

Modeling Thin Film CdS Development in a Chemical Bath Deposition Process

2000 ◽  
Vol 39 (9) ◽  
pp. 3272-3283 ◽  
Author(s):  
M. Kostoglou ◽  
N. Andritsos ◽  
A. J. Karabelas
Keyword(s):  
Thin Film ◽  
Chemical Bath Deposition ◽  
Deposition Process

Reaction couples of ceramic thin films prepared by CVD

1988 ◽  
Vol 46 ◽  
pp. 798-799
Author(s):  
D.W. Susnitzky ◽  
S.R. Summerfelt ◽  
C.B. Carter
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Solid State Reactions ◽  
Spatial Distributions ◽  
Diffusion Couples ◽  
Kinetics Studies ◽  
Ceramic Thin Films ◽  
Initial Stage

Solid-state reactions have traditionally been studied in the form of diffusion couples. This ‘bulk’ approach has been modified, for the specific case of the reaction between NiO and Al2O3, by growing NiAl2O4 (spinel) from electron-transparent Al2O3 TEM foils which had been exposed to NiO vapor at 1415°C. This latter ‘thin-film’ approach has been used to characterize the initial stage of spinel formation and to produce clean phase boundaries since further TEM preparation is not required after the reaction is completed. The present study demonstrates that chemical-vapor deposition (CVD) can be used to deposit NiO particles, with controlled size and spatial distributions, onto Al2O3 TEM specimens. Chemical reactions do not occur during the deposition process, since CVD is a relatively low-temperature technique, and thus the NiO-Al2O3 interface can be characterized. Moreover, a series of annealing treatments can be performed on the same sample which allows both Ni0-NiAl2O4 and NiAl2O4-Al2O3 interfaces to be characterized and which therefore makes this technique amenable to kinetics studies of thin-film reactions.

Characteristics of Zinc Oxide Film Prepared by Chemical Bath Deposition Method

2014 ◽  
Vol 602-603 ◽  
pp. 871-875
Author(s):  
Yen Pei Fu ◽  
Jian Jhih Chen
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Bath Deposition ◽  
Deposition Time ◽  
Oxide Films ◽  
Hexagonal Structure ◽  
Zno Films ◽  
Zinc Oxide Film ◽  
Incident Wavelength ◽  
Zinc Oxide Films

In this study, ZnO films, prepared by Chemical Bath Deposition (CBD), are applied as the conductive layers for thin film solar cells. Zinc acetate is used as a source of zinc, and different proportions of ammonia solution are added and well mixed. The growth of zinc oxide films in reaction solutions is taken place at 80°C and then heated to 500°C for one hour. In this study, the different ammonia concentrations and deposition times is controlled. The thin film structure is Hexagonal structure, which is determined by X-ray diffraction spectrometer (XRD) analysis. Scanning electron microscopy (SEM) is used as the observation of surface morphology, the bottom of the film is the interface where the heterogeneous nucleation happens. With the increase of deposition time, there were a few attached zinc oxide particles, which is formed by homogeneous nucleation. According to UV / visible light (UV / Vis) absorption spectrometer transmittance measurements and the relationship between/among the incident wavelength, it can be converted to the energy gaps (Eg), which are about 3.0 to 3.2eV, by using fluorescence spectroscopy analysis. The emission of zinc oxide films has two wavelengths which are located on 510nm and 570nm. According to Based on the all analytic results, the ammonia concentration at 0.05M, and the deposition time is 120 minutes, would obtain the conditions of ZnO films which is more suitable for applications of conductive layer material in thin film solar cell.

Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process

2002 ◽  
Vol 407 (1-2) ◽  
pp. 126-131 ◽  
Author(s):  
Shin-ichi Aoqui ◽  
Hisatomo Miyata ◽  
Tamiko Ohshima ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara
Keyword(s):  
Thin Film ◽  
Boron Carbide ◽  
Excimer Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Krf Excimer Laser
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