Structure evolution from nanocolumns to nanoporous of nitrogen doped amorphous carbon films deposited by magnetron sputtering

2010 ◽  
Vol 256 (22) ◽  
pp. 6506-6511 ◽  
Author(s):  
Bin Zhang ◽  
Yuanlie Yu ◽  
Zhou Wang ◽  
Junyan Zhang
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Structure Evolution ◽  
Amorphous Carbon Films ◽  
Nitrogen Doped

Structural Analysis of Boron- and Nitrogen-Doped Amorphous Carbon Films from Bio-Product

2020 ◽  
Vol 860 ◽  
pp. 190-195
Author(s):  
Irma Septi Ardiani ◽  
Khoirotun Nadiyyah ◽  
Anna Zakiyatul Laila ◽  
Sarayut Tunmee ◽  
Hideki Nakajima ◽  
...  
Keyword(s):  
Structural Analysis ◽  
Amorphous Carbon ◽  
Carbon Film ◽  
Carbon Films ◽  
Basic Material ◽  
Carbon Phase ◽  
Amorphous Carbon Film ◽  
Amorphous Carbon Films ◽  
Nitrogen Doped ◽  
P Type

Amorphous carbon films have been explored and used in a wide variety of applications. With the n-type and p-type amorphous carbon film, it can be used to make p-n junctions for solar cells. This research aims to study the structure of boron- and nitrogen-doped amorphous carbon (a-C:B and a-C:N) films. This research uses the basic material of bio-product from palmyra sugar to form amorphous carbon. Amorphous carbon was synthesized by heating the palmyra sugar at 250°C. The results of XRD showed that the doped films produce an amorphous carbon phase. PES was used to analyze the bonding state of dopants in the sample. B4C, BC3, and BC2O bonds formed in a-C:B, while pyridine and pyrrolic formed in a-C:N.

Voids Investigation of Amorphous Carbon Films Deposited by DC-Magnetron Sputtering: A Small Angle x-ray Scattering and Gas Thermal Effusion Study

1999 ◽  
Vol 593 ◽  
Author(s):  
F.L. Freire ◽  
L.G. Jacobsohn ◽  
D.F. Franceschini ◽  
S.S. Camargo
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Small Angle ◽  
Ion Beam ◽  
Carbon Films ◽  
Dc Magnetron Sputtering ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering

ABSTRACTAmorphous carbon films were deposited onto (100) Si crystals and onto ultra-pure Al foils by dc-magnetron sputtering with different Ar plasma pressures, from 0.17 to 1.4 Pa. We investigate the voids structure and the voids density in these films by means of small angle x-ray scattering (SAXS) and mass spectrometry of effused gases. The analysis of the effusion spectra provided clear evidence that films deposited at lower pressures are compact, while the films deposited at higher pressure present a more open structural arrangement, confirming density results obtained by using ion beam techniques. SAXS results reveal that the fraction of open volumes increases with the plasma pressure: a direct correlation between film density and open volume fraction is found. These different film microstructures could be explained by the existence of different bombarding regimes during film growth

Optical and structural properties of nitrogen doped amorphous carbon films grown by rf plasma-enhanced CVD

2001 ◽  
Vol 10 (3-7) ◽  
pp. 1002-1006 ◽  
Author(s):  
Y. Hayashi ◽  
K.M. Krishna ◽  
H. Ebisu ◽  
T. Soga ◽  
M. Umeno ◽  
...  
Keyword(s):  
Structural Properties ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Rf Plasma ◽  
Amorphous Carbon Films ◽  
Nitrogen Doped ◽  
Plasma Enhanced Cvd
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