Low temperature ITO thin film deposition on PES substrate using pulse magnetron sputtering

2008 ◽  
Vol 254 (11) ◽  
pp. 3262-3268 ◽  
Author(s):  
Y.C. Lin ◽  
J.Y. Li ◽  
W.T. Yen
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Pulse Magnetron

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

2012 ◽  
Vol 9 (11-12) ◽  
pp. 1041-1073 ◽  
Author(s):  
Francoise Massines ◽  
Christian Sarra-Bournet ◽  
Fiorenza Fanelli ◽  
Nicolas Naudé ◽  
Nicolas Gherardi
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Atmospheric Pressure ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Plasma Technology

Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 160 ◽  
pp. 410-417 ◽  
Author(s):  
D.L. Ma ◽  
H.Y. Liu ◽  
Q.Y. Deng ◽  
W.M. Yang ◽  
K. Silins ◽  
...  
Keyword(s):  
Thin Film ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
High Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optimal Target ◽  
Pulsed Magnetron

Thin film deposition by magnetron sputtering and determination of some physical parameters

1989 ◽  
Vol 176 (2) ◽  
pp. 219-226 ◽  
Author(s):  
M.M.D. Ramos ◽  
J.B. Almeida ◽  
M.I.C. Ferreira ◽  
M.P. Dos Santos
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Physical Parameters
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