Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography

2007 ◽  
Vol 253 (22) ◽  
pp. 9035-9038 ◽  
Author(s):  
Wei Li ◽  
Ling Xu ◽  
Wei-Ming Zhao ◽  
Ping Sun ◽  
Xin-Fan Huang ◽  
...  
Keyword(s):  
Large Scale ◽  
Nanosphere Lithography ◽  
Nanopillar Arrays

Large-Scale Metasurfaces Based on Grayscale Nanosphere Lithography

ACS Photonics ◽  
2021 ◽  
Author(s):  
Hanyu Zheng ◽  
You Zhou ◽  
Chibuzor Fabian Ugwu ◽  
Andrew Du ◽  
Ivan I. Kravchenko ◽  
...  
Keyword(s):  
Large Scale ◽  
Nanosphere Lithography

Fabrication of silicon hierarchical nanopillar arrays based on nanosphere lithography

2014 ◽  
Vol 9 (10) ◽  
pp. 655-659 ◽  
Author(s):  
Zongming Su ◽  
Xiao‐Sheng Zhang ◽  
Wei Hu ◽  
Wen Liu ◽  
Mengdi Han ◽  
...  
Keyword(s):  
Nanosphere Lithography ◽  
Nanopillar Arrays

Broadband antireflective Si nanopillar arrays produced by nanosphere lithography

2009 ◽  
Vol 86 (4-6) ◽  
pp. 850-852 ◽  
Author(s):  
Hongbo Xu ◽  
Nan Lu ◽  
Dianpeng Qi ◽  
Liguo Gao ◽  
Juanyuan Hao ◽  
...  
Keyword(s):  
Nanosphere Lithography ◽  
Nanopillar Arrays

Nanohole and Nanopillar Arrays on GaAs and GaSb Using Nanosphere Lithography and Bromine Ion Beam Assisted Etching

2007 ◽  
Vol 1059 ◽  
Author(s):  
Xifeng Qian ◽  
Jin Li ◽  
William D. Goodhue
Keyword(s):  
High Performance ◽  
Ion Beam ◽  
Single Layer ◽  
Nanosphere Lithography ◽  
Periodic Arrays ◽  
High Uniformity ◽  
Polystyrene Nanospheres ◽  
Bandgap Semiconductors ◽  
Substrate Surfaces ◽  
Nanopillar Arrays

ABSTRACTNanosphere lithography (NSL) has been successfully used to nanopattern silicon and glass substrate surfaces using a spin process in conjunction with the chemical functionalized polystyrene nanospheres. Here, we report for the first time the formation of periodic arrays of nanohole and nanopillar on GaAs and GaSb substrates using a combination of NSL, electron beam (E-Beam) evaporation and Bromine Ion Beam Assisted Etching (Br-IBAE). When 250 nm diameter nanospheres were used as a template or mask, periodic arrays of approximate 55 nm hexagonal nanoholes and 39 nm hexagonal nanopillars were obtained from double-layer nanosphere templates, while arrays of approximate 65nm triangular nanohole and 53nm triangular nanopillar were obtained from single-layer nanosphere templates. The high uniformity of these nanohole and nanopillar arrays demonstrates the technique¡¦s potential for applications in the fabrication of novel high performance opto- and electronic devices in the important GaAs and GaSb III-V direct bandgap semiconductors.

Large-Scale Fabrication of Protein Nanoarrays Based on Nanosphere Lithography

Langmuir ◽  
2005 ◽  
Vol 21 (20) ◽  
pp. 9274-9279 ◽  
Author(s):  
Yuguang Cai ◽  
Benjamin M. Ocko
Keyword(s):  
Large Scale ◽  
Nanosphere Lithography ◽  
Protein Nanoarrays

scholarly journals Fabrication and characterisation of GaAs nanopillars using nanosphere lithography and metal assisted chemical etching

RSC Advances ◽  
2016 ◽  
Vol 6 (36) ◽  
pp. 30468-30473 ◽  
Author(s):  
A. Cowley ◽  
J. A. Steele ◽  
D. Byrne ◽  
R. K. Vijayaraghavan ◽  
P. J. McNally
Keyword(s):  
Chemical Etching ◽  
Low Cost ◽  
Nanosphere Lithography ◽  
Fabrication Procedure ◽  
Metal Assisted Chemical Etching ◽  
Nanopillar Arrays ◽  
Lithography Technique

We present a low-cost fabrication procedure for the production of nanoscale periodic GaAs nanopillar arrays, using the nanosphere lithography technique as a templating mechanism and the electrochemical metal assisted etch process (MacEtch).

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