High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries
2006 ◽
Vol 253
(5)
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pp. 2752-2757
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Keyword(s):
2009 ◽
Vol 24
(9)
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pp. 095019
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Keyword(s):
2009 ◽
Vol 55
(5(1))
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pp. 1931-1935
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2007 ◽
Vol 46
(12)
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pp. 7806-7811
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2012 ◽
Vol 30
(6)
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pp. 061508
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2006 ◽
Vol 352
(9-20)
◽
pp. 1471-1474
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Keyword(s):