Simulation of island aggregation influenced by substrate temperature, incidence kinetic energy and intensity in pulsed laser deposition

2006 ◽  
Vol 253 (2) ◽  
pp. 874-880 ◽  
Author(s):  
Duanming Zhang ◽  
Li Guan ◽  
Zhihua Li ◽  
Guijun Pan ◽  
Xinyu Tan ◽  
...  
Keyword(s):  
Kinetic Energy ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

Influence of kinetic energy and substrate temperature on thin film growth in pulsed laser deposition

2006 ◽  
Vol 200 (12-13) ◽  
pp. 4027-4031 ◽  
Author(s):  
D.M. Zhang ◽  
L. Guan ◽  
Z.H. Li ◽  
G.J. Pan ◽  
H.Z. Sun ◽  
...  
Keyword(s):  
Thin Film ◽  
Kinetic Energy ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

scholarly journals Effects of pressure and substrate temperature on the growth of Al-doped ZnO films by pulsed laser deposition

2020 ◽  
Vol 7 (1) ◽  
pp. 016414
Author(s):  
Reeson Kek ◽  
Kwan-Chu Tan ◽  
Chen Hon Nee ◽  
Seong Ling Yap ◽  
Song Foo Koh ◽  
...  
Keyword(s):  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Films ◽  
Doped Zno

scholarly journals Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

2017 ◽  
Vol 35 (1) ◽  
pp. 254-264
Author(s):  
Joanna Piwowarczyk ◽  
Roman Jędrzejewski ◽  
Jolanta Baranowska
Keyword(s):  
Mechanical Properties ◽  
Chemical Composition ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Total Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Aluminum Oxynitride ◽  
Negative Effect ◽  
Oxynitride Coatings

AbstractThe paper presents results of the investigation on the influence of deposition parameters, such as substrate temperature, total gas pressure and reactive gas composition on the structure, chemical composition and mechanical properties of aluminum oxynitride coatings obtained by pulsed laser deposition (PLD) method. Selection of process parameter ranges, which could be promising for aluminum oxynitride (ALON) coatings deposition, was the main objective of the work. Two series of experiments were carried out with varied pressure and temperature. It was found that from the chemical composition viewpoint, the most promising are atmospheres containing 20 % to 40 % oxygen. The nitrogen to oxygen ratios in the coatings can be controlled by increasing the total pressure or substrate temperature. However, increasing the pressure has a negative effect on the O + N:Al ratio, mechanical properties and quality of the coatings. The influence of temperature is much less drastic and more controllable. Increasing the deposition temperature is much more beneficial since it improves the mechanical properties and can compensate to some extent the negative effect of the total pressure. From the coating quality viewpoint, it is possible to establish an optimum temperature range for which the coatings are characterized by a compact structure and a limited number of droplets.

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