Overcoat dependence of laser-induced damage threshold of 355nm HR coatings

2006 ◽  
Vol 252 (6) ◽  
pp. 2126-2130 ◽  
Author(s):  
Meiqiong Zhan ◽  
Hongbo He ◽  
Yuanan Zhao ◽  
Guanglei Tian ◽  
Jianda Shao ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Laser Induced Damage ◽  
Hr Coatings

Stress, absorptance and laser-induced damage threshold properties of 355-nm HR coatings

2005 ◽  
Vol 80 (8) ◽  
pp. 1007-1010 ◽  
Author(s):  
M. Zhan ◽  
Y. Zhao ◽  
G. Tian ◽  
H. He ◽  
J. Shao ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Laser Induced Damage ◽  
Hr Coatings

Temperature dependence of laser-induced damage threshold of 355-nm Al2O3/MgF2 HR coatings

2004 ◽  
Author(s):  
Meiqiong Zhan ◽  
Tianya Tan ◽  
Dawei Zhang ◽  
Hongbo He ◽  
Jianda Shao ◽  
...  
Keyword(s):  
Temperature Dependence ◽  
Damage Threshold ◽  
Laser Induced Damage ◽  
Hr Coatings

Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings

2015 ◽  
Vol 55 (1) ◽  
pp. 104 ◽  
Author(s):  
Marius Mrohs ◽  
Lars Jensen ◽  
Stefan Günster ◽  
Thimotheus Alig ◽  
Detlev Ristau
Keyword(s):  
Damage Threshold ◽  
Dual Wavelength ◽  
Antireflective Coatings ◽  
Dual Wavelength Laser ◽  
Laser Induced Damage

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

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