Epitaxial growth of tin oxide films on (001) TiO2 substrates by KrF and XeCl excimer laser annealing

2005 ◽  
Vol 248 (1-4) ◽  
pp. 118-122 ◽  
Author(s):  
T. Tsuchiya ◽  
A. Watanabe ◽  
T. Kumagai ◽  
S. Mizuta
Keyword(s):  
Epitaxial Growth ◽  
Excimer Laser ◽  
Tin Oxide ◽  
Laser Annealing ◽  
Oxide Films ◽  
Excimer Laser Annealing ◽  
Tin Oxide Films ◽  
Xecl Excimer Laser

Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display

2004 ◽  
Vol 460 (1-2) ◽  
pp. 291-294 ◽  
Author(s):  
Wonsuk Chung ◽  
Michael O. Thompson ◽  
Paul Wickboldt ◽  
Daniel Toet ◽  
Paul G. Carey
Keyword(s):  
Excimer Laser ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Flexible Display ◽  
Xecl Excimer Laser

Excimer laser processing of indium‐tin‐oxide films: An optical investigation

1995 ◽  
Vol 78 (10) ◽  
pp. 6211-6219 ◽  
Author(s):  
T. Szörényi ◽  
L.D. Laude ◽  
I. Bertóti ◽  
Z. Kántor ◽  
Zs. Geretovszky
Keyword(s):  
Excimer Laser ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Laser Processing ◽  
Oxide Films ◽  
Optical Investigation ◽  
Tin Oxide Films

In-Situ Fabrication of Gate Oxide and Poly-Si Film by XeCl Excimer Laser Annealing

1997 ◽  
Vol 36 (Part 1, No. 3B) ◽  
pp. 1614-1617
Author(s):  
Cheol-Min Park ◽  
Byung-Hyuk Min ◽  
Juhn-Suk Yoo ◽  
Hong-Seok Choi ◽  
Min-Koo Han
Keyword(s):  
Excimer Laser ◽  
Laser Annealing ◽  
Gate Oxide ◽  
Excimer Laser Annealing ◽  
In Situ Fabrication ◽  
Xecl Excimer Laser

6.4: Crystallization of Ultra-low Temperature ITO by XeCl Excimer Laser Annealing

2002 ◽  
Vol 33 (1) ◽  
pp. 57 ◽  
Author(s):  
Wonsuk Chung ◽  
Michael O. Thompson ◽  
Paul Wickboldt ◽  
Daniel Toet ◽  
Paul G. Carey
Keyword(s):  
Low Temperature ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Xecl Excimer Laser
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