RF plasma reactive pulsed laser deposition of boron nitride thin films

2005 ◽  
Vol 247 (1-4) ◽  
pp. 123-127 ◽  
Author(s):  
B. Mitu ◽  
P. Bilkova ◽  
V. Marotta ◽  
S. Orlando ◽  
A. Santagata
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Rf Plasma

Mechanical and Chemical Properties of CBxNy and CSixNy Thin Films Grown by N*-Plasma Assisted Pulsed Laser Deposition

1999 ◽  
Vol 593 ◽  
Author(s):  
T. Thärigen ◽  
V. Riede ◽  
G. Lippold ◽  
E. Hartmann ◽  
R. Hesse ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Chemical Properties ◽  
Plasma Source ◽  
Laser Deposition ◽  
Lower Amount ◽  
Rf Plasma ◽  
Clear Correlation

ABSTRACTCarbon silicon nitride (CSixNy), and carbon boron nitride (CBxNy) thin films have been grown by pulsed laser deposition (PLD) of various carbon (silicon/boron) (nitride) targets using an additional nitrogen RF plasma source on [100] oriented silicon substrates without additional heating. The CSixNy and CBxNy thin films were amorphous and showed nano hardness up to 23 GPa compared to 14 GPa for silicon and maximum nitrogen content of 30 at%. The maximum nanohardness was achieved for 10% Si and 10% B content in the films. The lower hardness of this films compared to the nanohardness of 30-50 GPa of DLC films indicates a lower amount of covalent carbon-nitrogen bonding in the films. However, in contrast to DLC films, the CSixNy and CBxNy films can be grown to thickness above 3 μm due to lower internal compressive stress. XPS of CSixNy and CBxNy film surfaces shows clear correlation of binding energy and intensity of N ls, C ls, and Si 2p peaks to composition of the PLD-targets and to nitrogen flow through plasma source, indicating soft changes of binding structure due to variation of PLD parameters. The results demonstrate the capability of the plasma assisted PLD process to deposit hard amorphous CSixNy, and CBxNy thin films with adjustable properties.

Microstructure of cubic boron nitride thin films grown by ion‐assisted pulsed laser deposition

1994 ◽  
Vol 76 (1) ◽  
pp. 295-303 ◽  
Author(s):  
D. L. Medlin ◽  
T. A. Friedmann ◽  
P. B. Mirkarimi ◽  
P. Rez ◽  
M. J. Mills ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Pulsed Laser Deposition ◽  
Cubic Boron Nitride ◽  
Pulsed Laser ◽  
Laser Deposition

Epitaxial CuO thin films prepared on MgAl2O4 (110) by RF-plasma assisted pulsed laser deposition

Vacuum ◽  
2019 ◽  
Vol 169 ◽  
pp. 108932
Author(s):  
Xiaohui Liu ◽  
Weidong Xu ◽  
Meng Xu ◽  
Xiaotao Hao ◽  
Xianjin Feng
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Rf Plasma

SBN thin films growth by RF plasma beam assisted pulsed laser deposition

2008 ◽  
Vol 93 (3) ◽  
pp. 795-800 ◽  
Author(s):  
N. D. Scarisoreanu ◽  
G. Dinescu ◽  
R. Birjega ◽  
M. Dinescu ◽  
D. Pantelica ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Rf Plasma ◽  
Plasma Beam

Influence of Substrate Temperature in Plasma Assisted Pulsed Laser Deposition of Hydroxyapatite Thin Films

2006 ◽  
Vol 514-516 ◽  
pp. 1029-1033
Author(s):  
Eugenio Luís Solla ◽  
Jacinto P. Borrajo ◽  
Pio González ◽  
Julia Serra ◽  
Stefano Chiussi ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Rf Discharge ◽  
Rf Plasma ◽  
X Ray Diffraction ◽  
Influence Of Substrate ◽  
Substrate Temperatures

The bioactive properties of hydroxyapatite (HA) are well known in the implant industry and coatings of HA have been used to enhance the adhesion of living tissue to metal prostheses. Pulsed laser deposition (PLD) in a water vapour atmosphere is an appropriate method for the production of crystalline HA coatings. In this work the effect of RF plasma on thin films of HA grown by PLD at different substrate temperatures has been studied. The physicochemical properties of the films were studied by Fourier transform infrared spectroscopy (FTIR), X-ray diffraction (XRD) and energy dispersive spectroscopy (EDS), showing that the incorporation of RF discharge in the deposition chamber can lead to changes in the crystallinity and deposition rate of the films but substrate temperature still plays the most important role.

scholarly journals RF-plasma assisted pulsed laser deposition of nitrogen-doped SrTiO3 thin films

2008 ◽  
Vol 93 (3) ◽  
pp. 721-727 ◽  
Author(s):  
I. Marozau ◽  
A. Shkabko ◽  
G. Dinescu ◽  
M. Döbeli ◽  
T. Lippert ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Rf Plasma ◽  
Nitrogen Doped

Layer-by-Layer Growth of GaN on Sapphire by Low Temperature Cyclic Pulsed Laser Deposition / Nitrogen RF Plasma

2002 ◽  
Vol 722 ◽  
Author(s):  
P. Sanguino ◽  
M. Niehus ◽  
S. Koynov ◽  
R. Schwarz ◽  
H. Alves ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Layer Growth ◽  
Laser Deposition ◽  
Rf Plasma ◽  
Liquid Gallium ◽  
Cyclic Process ◽  
Layer By Layer ◽  
Time Duration

AbstractRecently we have proposed a new layer-by-layer method for deposition of group-III nitrides from elemental precursors (Ga, N2) [1,2]. This technique is based on a two-step cyclic process, which alternates Pulsed Laser Deposition (PLD), of a liquid gallium target and nitrogen plasma treatment. In this work, we proceed on the development of this flexible cyclic deposition technique and study the influence of the power and time duration of the 1 mbar nitrogen RF plasma on the GaN thin films. The layers are deposited on pre-nitridated sapphire (0001) substrates at low deposition temperature (600° C) to minimise reevaporation. The cyclic GaN thin films thus obtained are compared in terms of crystal alignment and nitrogen incorporation. X-ray diffraction and optical transmission spectra are the selected tools used to characterise and compare the deposited films.

Pulsed laser deposition of boron nitride thin films

2008 ◽  
Vol 163 (4-6) ◽  
pp. 293-298 ◽  
Author(s):  
N. Acacia ◽  
E. Fazio ◽  
F. Neri ◽  
P. M. Ossi ◽  
S. Trusso ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition
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