Application of glow discharge mass spectrometry for direct trace impurity analysis in Cu films

J.-W. Lim; K. Mimura; M. Isshiki

doi:10.1016/j.apsusc.2003.12.007

Application of glow discharge mass spectrometry for direct trace impurity analysis in Cu films

Applied Surface Science ◽

10.1016/j.apsusc.2003.12.007 ◽

2004 ◽

Vol 227 (1-4) ◽

pp. 300-305 ◽

Cited By ~ 14

Author(s):

J.-W. Lim ◽

K. Mimura ◽

M. Isshiki

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Glow Discharge Mass Spectrometry ◽

Trace Impurity ◽

Cu Films ◽

Impurity Analysis

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Refining Effect of Hydrogen Plasma Arc Melting and Trace Impurity Analysis by Glow Discharge Mass Spectrometry

Geosystem Engineering ◽

10.1080/12269328.2007.10541266 ◽

2007 ◽

Vol 10 (1) ◽

pp. 15-20

Author(s):

Jae-Won Lim ◽

Good-Sun Choi ◽

Dmitri Elanski ◽

Kouji Mimura ◽

Minoru Isshiki

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Hydrogen Plasma ◽

Glow Discharge Mass Spectrometry ◽

Trace Impurity ◽

Plasma Arc ◽

Refining Effect ◽

Impurity Analysis ◽

Arc Melting

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Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry: Concentration Change of Impurities by Applying Negative Substrate Bias Voltage

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.8267 ◽

2004 ◽

Vol 43 (12) ◽

pp. 8267-8272 ◽

Cited By ~ 7

Author(s):

Jae-Won Lim ◽

Kouji Mimura ◽

Minoru Isshiki

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Bias Voltage ◽

Glow Discharge Mass Spectrometry ◽

Trace Impurity ◽

Substrate Bias ◽

Concentration Change ◽

Substrate Bias Voltage ◽

Impurity Analysis ◽

Negative Substrate Bias

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Determination of trace impurity elements in MnZn ferrite powder by direct current glow discharge mass spectrometry

Journal of Central South University ◽

10.1007/s11771-018-3851-3 ◽

2018 ◽

Vol 25 (7) ◽

pp. 1590-1597 ◽

Cited By ~ 2

Author(s):

Liang Fu ◽

Jun-cai Ma ◽

Shu-yun Shi

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Direct Current ◽

Glow Discharge Mass Spectrometry ◽

Trace Impurity ◽

Ferrite Powder ◽

Mnzn Ferrite ◽

Impurity Elements

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Interpretation of Dominant Impurities in Cu Films by Secondary Ion Mass Spectrometry and Glow Discharge Mass Spectrometry

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.373 ◽

2005 ◽

Vol 44 (1A) ◽

pp. 373-374 ◽

Cited By ~ 4

Author(s):

Jae-Won Lim ◽

Joon Woo Bae ◽

Kouji Mimura ◽

Minoru Isshiki

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Secondary Ion Mass Spectrometry ◽

Glow Discharge Mass Spectrometry ◽

Cu Films ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Quadrupole versus magnetic sector glow discharge mass spectrometry: comparison of quantitative analytical capabilities

Journal of Analytical Atomic Spectrometry ◽

10.1039/ja9920700943 ◽

1992 ◽

Vol 7 (6) ◽

pp. 943 ◽

Cited By ~ 18

Author(s):

Angelika Raith ◽

Wojciech Vieth ◽

John C. Huneke ◽

Robert C. Hutton

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Glow Discharge Mass Spectrometry ◽

Magnetic Sector

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Comparison between the use of direct current glow discharge mass spectrometry and inductively coupled plasma quadrupole mass spectrometry for the analysis of trace elements in nuclear samples

Fresenius Journal of Analytical Chemistry ◽

10.1007/s002160000529 ◽

2000 ◽

Vol 368 (1) ◽

pp. 95-102 ◽

Cited By ~ 9

Author(s):

L. Aldave de las Heras ◽

F. Bocci ◽

M. Betti ◽

L. O. Actis-Dato

Keyword(s):

Mass Spectrometry ◽

Trace Elements ◽

Glow Discharge ◽

Direct Current ◽

Inductively Coupled Plasma ◽

Glow Discharge Mass Spectrometry ◽

Quadrupole Mass ◽

Quadrupole Mass Spectrometry ◽

Inductively Coupled

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The effects of water vapor in glow discharge mass spectrometry

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(94)80145-2 ◽

1994 ◽

Vol 49 (12-14) ◽

pp. 1747-1757 ◽

Cited By ~ 27

Author(s):

P.H. Ratliff ◽

W.W. Harrison

Keyword(s):

Mass Spectrometry ◽

Water Vapor ◽

Glow Discharge ◽

Glow Discharge Mass Spectrometry

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Matrix effects and the relationship between the relative sensitivity factors and the ionization potential in glow discharge mass spectrometry using Kr/0.2vol.%H2 mixture.

BUNSEKI KAGAKU ◽

10.2116/bunsekikagaku.48.77 ◽

1999 ◽

Vol 48 (1) ◽

pp. 77-86 ◽

Cited By ~ 2

Author(s):

Morimasa SAITO

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Ionization Potential ◽

Matrix Effects ◽

Relative Sensitivity ◽

Glow Discharge Mass Spectrometry ◽

Sensitivity Factors ◽

The Relationship

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Relative Sensitivity Factors for Analyzing Carbon and Nitrogen in Steels by Glow Discharge Mass Spectrometry

Materials Transactions JIM ◽

10.2320/matertrans1989.41.516 ◽

2000 ◽

Vol 41 (4) ◽

pp. 516-521 ◽

Cited By ~ 4

Author(s):

Shinji Itoh ◽

Hitoshi Yamaguchi ◽

Takayuki Yoshioka ◽

Takashi Kimura ◽

Takeshi Kobayashi

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Relative Sensitivity ◽

Glow Discharge Mass Spectrometry ◽

Carbon And Nitrogen ◽

Sensitivity Factors

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Glow discharge mass spectrometry: a current assessment

Journal of Analytical Atomic Spectrometry ◽

10.1039/ja9880300867 ◽

1988 ◽

Vol 3 (6) ◽

pp. 867 ◽

Cited By ~ 33

Author(s):

W. W. Harrison

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Glow Discharge Mass Spectrometry ◽

Current Assessment ◽

A Current

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