Photo-assisted degradation of 2,4,5-trichlorophenoxyacetic acid by Fe(II)-catalyzed activation of Oxone process: The role of UV irradiation, reaction mechanism and mineralization

2012 ◽  
Vol 123-124 ◽  
pp. 151-161 ◽  
Author(s):  
Y.R. Wang ◽  
W. Chu
Keyword(s):  
Reaction Mechanism ◽  
Uv Irradiation ◽  
Trichlorophenoxyacetic Acid

scholarly journals Conversion of Methanol on Rutile TiO2 (110) and Tungsten Oxide Clusters: 2. The Role of Defects and Electron Transfer in Bifunctional Oxidic Photocatalysts

2021 ◽  
Author(s):  
Lars Mohrhusen ◽  
Jessica Kräuter ◽  
Katharina Al-Shamery
Keyword(s):  
Electron Transfer ◽  
Transition Metal ◽  
Metal Oxide ◽  
Tungsten Oxide ◽  
Organic Compounds ◽  
Uv Irradiation ◽  
Organic P ◽  
Rutile Tio2 ◽  
Metal Oxide Surfaces

The photochemical conversion of organic compounds on tailored transition metal oxide surfaces by (UV) irradiation has found wide applications ranging from the production of chemicals to the degradation of organic...

Oxidations ofNω-Hydroxyarginine Analogues and VariousN-Hydroxyguanidines by NO Synthase II: Key Role of Tetrahydrobiopterin in the Reaction Mechanism and Substrate Selectivity

2001 ◽  
Vol 14 (2) ◽  
pp. 202-210 ◽  
Author(s):  
Catherine Moali ◽  
Jean-Luc Boucher ◽  
Axelle Renodon-Corniere ◽  
Dennis J. Stuehr ◽  
Daniel Mansuy
Keyword(s):  
Reaction Mechanism ◽  
No Synthase ◽  
Substrate Selectivity

Effect of UV irradiation on stabilized collagen: Role of chromium(III)

2008 ◽  
Vol 62 (1) ◽  
pp. 11-16 ◽  
Author(s):  
Nishtar Nishad Fathima ◽  
Raju Suresh ◽  
Jonnalagadda Raghava Rao ◽  
Balachandran Unni Nair ◽  
Thirumalachari Ramasami
Keyword(s):  
Uv Irradiation

Reaction Mechanism and Role of the Support in the Partial Oxidation of Methane on Rh/Al2O3

1996 ◽  
Vol 159 (2) ◽  
pp. 418-426 ◽  
Author(s):  
Dezheng Wang ◽  
Olivier Dewaele ◽  
Ann M.De Groote ◽  
Gilbert F. Froment
Keyword(s):  
Reaction Mechanism ◽  
Partial Oxidation ◽  
Partial Oxidation Of Methane ◽  
Oxidation Of Methane

From the Understanding of the Reaction Mechanism Towards Optimizing the Deposition Rate and Optoelectronic Properties of a-Si:H

1989 ◽  
Vol 149 ◽  
Author(s):  
S. Veprek ◽  
M. Heintze ◽  
R. Bayer ◽  
N. Jurčik-Rajman
Keyword(s):  
Reaction Mechanism ◽  
Surface Coverage ◽  
Kinetic Studies ◽  
Reactive Intermediates ◽  
Sticking Coefficient ◽  
High Quality ◽  
Rate Determining Step ◽  
Homogeneous Good ◽  
Good Agreement

ABSTRACTWe present new results of kinetic studies of the deposition of high quality a-Si:H which strongly support the reaction mechanism suggested in our earlier papers: 1. SiH4 → SiH2; 2. SiH2 + SiS4 → Si2H6 (SiH2 + Si2H6 → Si3H6); 3. Si2H6 → 2a-Si:H (Si3H8 → 3a-Si:H). The “SiH3 mechanism”, as promoted by several workers, is in contradiction with these experimental facts.The di- and trisilane, which have a much higher reactive sticking coefficient than monosilane, play the role of reactive intermediates which facilitate the heterogeneous decomposition of silicon carrying species at the surface of the growing film. The values of the reactive sticking coefficient of Si2H6 and Si3H8 depend on the surface coverage by chemisorbed hydrogen; they increase with decreasing surface coverage. Under the conditions of the growth of high quality a-Si:H films the reactive sticking coefficient of disilane amounts to 10−4 to 10−2 which is in a good agreement with recent data of other authors.The rate determining step of the growth of high quality a-Si:H films is the desorption of hydrogen from the surface of the growing film. This can be strongly enhanced by ion bombardment at impact energy of <100 eV. In this way, homogeneous, good quality films were deposited at rates up to 1800 Angströms/min, and there is a well justified hope that this rate can be further increased.

scholarly journals Photolysis of sulfamethazine using UV irradiation in an aqueous medium

RSC Advances ◽  
2018 ◽  
Vol 8 (3) ◽  
pp. 1427-1435 ◽  
Author(s):  
Zhigang Yi ◽  
Juan Wang ◽  
Qiong Tang ◽  
Tao Jiang
Keyword(s):  
Aqueous Medium ◽  
Uv Irradiation ◽  
Reactive Species ◽  
Photochemical Behavior

The role of reactive species in SMN photolysis and the effects of dissolved substances on SMN photochemical behavior.

scholarly journals Tuning the Biginelli reaction mechanism by the ionic liquid effect: the combined role of supported heteropolyacid derivatives and acidic strength

RSC Advances ◽  
2019 ◽  
Vol 9 (46) ◽  
pp. 27125-27135 ◽  
Author(s):  
Elon F. Freitas ◽  
Roberto Y. Souza ◽  
Saulo T. A. Passos ◽  
José A. Dias ◽  
Silvia C. L. Dias ◽  
...  
Keyword(s):  
Ionic Liquid ◽  
Reaction Mechanism ◽  
Biginelli Reaction

Heteropolyacids and ionic liquid effect allowed tuning of the Biginelli reaction mechanism and synthesis of 3,4-dihydropyrimidin-2(1H)-one/thione derivatives in an efficient, recyclable fashion. The role of acidic strength and supported heteropolyacid is disclosed.

scholarly journals Uncatalyzed conjugate addition of organozinc halides to enones in DME: a combined experimental/computational study on the role of the solvent and the reaction mechanism

2020 ◽  
Vol 11 (1) ◽  
pp. 257-263 ◽  
Author(s):  
Gianluca Casotti ◽  
Gianluca Ciancaleoni ◽  
Filippo Lipparini ◽  
Chiara Nieri ◽  
Anna Iuliano
Keyword(s):  
Reaction Mechanism ◽  
Addition Reaction ◽  
Computational Study ◽  
Conjugate Addition

The reaction mechanism of a new conjugate addition reaction of organozinc halides to enones is disclosed by a combined experimental/computational study.

Sign in / Sign up

Export Citation Format

Share Document