Evolution of the deposition rate during pulsed laser deposition of hydroxyapatite coatings and its relation with target morphology

2001 ◽  
Vol 72 (5) ◽  
pp. 613-618 ◽  
Author(s):  
J.M. Fernández-Pradas ◽  
L. Clèries ◽  
P. Serra ◽  
G. Sardin ◽  
J.L. Morenza
Keyword(s):  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Hydroxyapatite Coatings

Pulsed laser deposition of silicon-substituted hydroxyapatite coatings

Vacuum ◽  
2008 ◽  
Vol 82 (12) ◽  
pp. 1383-1385 ◽  
Author(s):  
E.L. Solla ◽  
J.P. Borrajo ◽  
P. González ◽  
J. Serra ◽  
S. Chiussi ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Hydroxyapatite Coatings

Growth of YBa2Cu3O7-deltathin films in pulsed laser deposition: influence of target, substrate and deposition rate

2000 ◽  
Vol 13 (3) ◽  
pp. 262-272 ◽  
Author(s):  
G A Farnan ◽  
M P McCurry ◽  
C C Smith ◽  
R J Turner ◽  
D G Walmsley
Keyword(s):  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Pulsed Laser ◽  
Laser Deposition

The Role of Si Substitution into Hydroxyapatite Coatings

2007 ◽  
Vol 361-363 ◽  
pp. 175-178 ◽  
Author(s):  
Eugenio Luís Solla ◽  
Frank Malz ◽  
Pio González ◽  
Julia Serra ◽  
Christian Jaeger ◽  
...  
Keyword(s):  
Solid State ◽  
Pulsed Laser Deposition ◽  
Solid State Nmr ◽  
Pulsed Laser ◽  
Phosphate Group ◽  
Laser Deposition ◽  
Hydroxyapatite Coatings

Silicon substituted Hydroxyapatite coatings were prepared by Pulsed Laser Deposition from targets made of mixtures of Hydroxyapatite with Si powder at different concentrations. The properties of the Si-HA coatings with several degrees of Si substitution were analyzed by different techniques such as FTIR, XRD, XPS and solid-state NMR. It was found that the Si incorporation causes an amorphization of the structure together with a loss of carbonate groups. Furthermore, the Si atoms are incorporated in the form of SiO4 4- groups, and H(PO4)2- appears as the predominant phosphate group.

Fabrication of TiNi shape memory alloy thin films by pulsed-laser deposition

2002 ◽  
Vol 17 (2) ◽  
pp. 279-283 ◽  
Author(s):  
X. Y. Chen ◽  
Y. F. Lu ◽  
Z. M. Ren ◽  
S. Zhu
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Substrate Temperature ◽  
Shape Memory ◽  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Crystallization Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Composition Control

Thin films of TiNi shape memory alloy have been prepared by pulsed-laser deposition at different substrate temperatures. The stoichiometry and crystallinity of the deposited films as functions of the substrate temperature were investigated. The deposition rate, surface morphology, crystallization temperature, and phase transformation behavior of the films were studied. It was found that both the substrate temperature and the laser fluence play important roles in the composition control and crystallization of the films. The deposition rate is of the order of 10−2 nm/pulse. The Ni content ranges from 46.7 to 52.0 at.%. The crystallization temperature of the amorphous Ti–51.5 at.% Ni films is around 460 °C. The activation energy of the crystallization process was determined by Kissinger's method to be 301 kJ/mol. The martensitic transformation temperature of the annealed Ti–51.5 at.% Ni film was determined to be −20.8 °C.

Epitaxial growth of Ge-Sb-Te films on KCl by high deposition rate pulsed laser deposition

2014 ◽  
Vol 115 (21) ◽  
pp. 213504 ◽  
Author(s):  
E. Thelander ◽  
J. W. Gerlach ◽  
U. Ross ◽  
F. Frost ◽  
B. Rauschenbach
Keyword(s):  
Pulsed Laser Deposition ◽  
Epitaxial Growth ◽  
Deposition Rate ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
High Deposition Rate

In-Situ Magnetic Field Induced Structure and Properties of Epitaxial Spinel Ferrite Thin Films Prepared by Pulsed Laser Deposition (PLD) (Dynamic Aurora PLD Method)

2004 ◽  
Vol 853 ◽  
Author(s):  
Naoki Wakiya ◽  
Toyokazu Nagamune ◽  
Kazuo Shinozaki ◽  
Nobuyasu Mizutani
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetic Properties ◽  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Spinel Ferrite ◽  
Pulsed Laser ◽  
Lattice Parameter ◽  
Laser Deposition

ABSTRACTThe influence of an in-situ magnetic field on the plume during pulsed laser deposition (PLD) to prepare epitaxial nickel zinc ferrite (NZF) thin films were investigated. An air core coil (solenoid coil) was installed between a target and a substrate, and up to 43 mT of magnetic field was generated by direct current (DC)(Dynamic Aurora PLD method). Application of magnetic field brought about following structural and property changes;(1) deposition rate was almost doubled, (2) the concentration of Ni and Zn in the film was decreased, (3) lattice parameter was unchanged, and (4) magnetization and coercivity was increased. Since deposition rate was increased by application of magnetic field, films with same thickness was also prepared without magnetic field, however, magnetic properties were unchanged. This indicates that application of in-situ magnetic field improved magnetic properties.

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