High-quality processing of CFRP with a 1.1-kW picosecond laser

2015 ◽  
Vol 119 (4) ◽  
pp. 1237-1243 ◽  
Author(s):  
Christian Freitag ◽  
Margit Wiedenmann ◽  
Jan-Philipp Negel ◽  
André Loescher ◽  
Volkher Onuseit ◽  
...  
Keyword(s):  
Picosecond Laser ◽  
High Quality

High quality machining of non-metals with a picosecond laser

2009 ◽  
Author(s):  
B. R. Campbell ◽  
J. A. Moore ◽  
T. M. Lehecka ◽  
J. G. Thomas ◽  
V. V. Semak
Keyword(s):  
Picosecond Laser ◽  
High Quality

Linear parabolic single-crystal diamond refractive lenses for synchrotron X-ray sources

2017 ◽  
Vol 24 (1) ◽  
pp. 103-109 ◽  
Author(s):  
Sergey Terentyev ◽  
Maxim Polikarpov ◽  
Irina Snigireva ◽  
Marco Di Michiel ◽  
Sergey Zholudev ◽  
...  
Keyword(s):  
Single Crystal ◽  
Focal Spot ◽  
Synthetic Diamond ◽  
Picosecond Laser ◽  
Radius Of Curvature ◽  
High Quality ◽  
X Ray ◽  
Single Crystal Diamond ◽  
Refractive Lens ◽  
Focusing Properties

Linear parabolic diamond refractive lenses are presented, designed to withstand high thermal and radiation loads coming from upgraded accelerator X-ray sources. Lenses were manufactured by picosecond laser treatment of a high-quality single-crystal synthetic diamond. Twelve lenses with radius of curvature at parabola apex R = 200 µm, geometrical aperture A = 900 µm and length L = 1.5 mm were stacked as a compound refractive lens and tested at the ESRF ID06 beamline. A focal spot of size 2.2 µm and a gain of 20 were measured at 8 keV. The lens profile and surface quality were estimated by grating interferometry and X-ray radiography. In addition, the influence of X-ray glitches on the focusing properties of the compound refractive lens were studied.

High-Quality High-Throughput Silicon Laser Milling Using a 1-kW Sub-Picosecond Laser

2020 ◽  
Author(s):  
Daniel Holder ◽  
Rudolf Weber ◽  
Christoph Röcker ◽  
Gerhard Kunz ◽  
David Bruneel ◽  
...  
Keyword(s):  
High Throughput ◽  
Picosecond Laser ◽  
High Quality ◽  
Laser Milling ◽  
Silicon Laser

Picosecond laser ablation of high-quality micro-grooves on CIGS (CuIn(1-x)Ga2Se x ) thin films

2020 ◽  
Vol 175 (7-8) ◽  
pp. 627-639
Author(s):  
Wenjun Wang ◽  
Aifei Pan ◽  
Tianqi Li ◽  
Rongheng Li ◽  
BenQ Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Picosecond Laser ◽  
High Quality

scholarly journals High Quality Laser Processing Technology with Deep Ultraviolet Picosecond Laser

2017 ◽  
Vol 45 (9) ◽  
pp. 554
Author(s):  
Junichi NISHIMAE ◽  
Masashi YOSHIMURA ◽  
Yusuke MORI ◽  
Yosuke ORII
Keyword(s):  
Laser Processing ◽  
Picosecond Laser ◽  
Processing Technology ◽  
High Quality ◽  
Deep Ultraviolet

Some problems of objective-prism spectra classification

1966 ◽  
Vol 24 ◽  
pp. 51-52
Author(s):  
E. K. Kharadze ◽  
R. A. Bartaya
Keyword(s):  
Short Wave ◽  
High Quality ◽  
Stellar Spectra ◽  
Objective Prism

The unique 70-cm meniscus-type telescope of the Abastumani Astrophysical Observatory supplied with two objective prisms and the seeing conditions characteristic at Mount Kanobili (Abastumani) permit us to obtain stellar spectra of a high quality. No additional design to improve the “climate” immediately around the telescope itself is being applied. The dispersions and photographic magnitude limits are 160 and 660Å/mm, and 12–13, respectively. The short-wave end of spectra reaches 3500–3400Å.

A non-cyanide method of electropolishing silver

1978 ◽  
Vol 36 (1) ◽  
pp. 146-147
Author(s):  
R. L. Lyles ◽  
S. J. Rothman ◽  
W. Jäger
Keyword(s):  
Electron Microscopy ◽  
Sulphuric Acid ◽  
Methyl Alcohol ◽  
Health Hazards ◽  
Silver Alloy ◽  
High Quality ◽  
Silver Alloys ◽  
Free Sample ◽  
Specimen Quality ◽  
Standard Techniques

Standard techniques of electropolishing silver and silver alloys for electron microscopy in most instances have relied on various CN recipes. These methods have been characteristically unsatisfactory due to difficulties in obtaining large electron transparent areas, reproducible results, adequate solution lifetimes, and contamination free sample surfaces. In addition, there are the inherent health hazards associated with the use of CN solutions. Various attempts to develop noncyanic methods of electropolishing specimens for electron microscopy have not been successful in that the specimen quality problems encountered with the CN solutions have also existed in the previously proposed non-cyanic methods.The technique we describe allows us to jet polish high quality silver and silver alloy microscope specimens with consistant reproducibility and without the use of CN salts.The solution is similar to that suggested by Myschoyaev et al. It consists, in order of mixing, 115ml glacial actic acid (CH3CO2H, specific wt 1.04 g/ml), 43ml sulphuric acid (H2SO4, specific wt. g/ml), 350 ml anhydrous methyl alcohol, and 77 g thiourea (NH2CSNH2).

A High Resolution Scanning Microscope

1968 ◽  
Vol 26 ◽  
pp. 356-357
Author(s):  
A. V. Crewe ◽  
J. Wall ◽  
L. M. Welter
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Spherical Aberration ◽  
Focal Length ◽  
Spot Size ◽  
Emission Source ◽  
Field Of View ◽  
Scanning Microscope ◽  
Magnetic Lens ◽  
High Quality

A scanning microscope using a field emission source has been described elsewhere. This microscope has now been improved by replacing the single magnetic lens with a high quality lens of the type described by Ruska. This lens has a focal length of 1 mm and a spherical aberration coefficient of 0.5 mm. The final spot size, and therefore the microscope resolution, is limited by the aberration of this lens to about 6 Å.The lens has been constructed very carefully, maintaining a tolerance of + 1 μ on all critical surfaces. The gun is prealigned on the lens to form a compact unit. The only mechanical adjustments are those which control the specimen and the tip positions. The microscope can be used in two modes. With the lens off and the gun focused on the specimen, the resolution is 250 Å over an undistorted field of view of 2 mm. With the lens on,the resolution is 20 Å or better over a field of view of 40 microns. The magnification can be accurately varied by attenuating the raster current.

Quantitative defect studies in semiconductor TEM samples prepared by low angle ion milling

1995 ◽  
Vol 53 ◽  
pp. 512-513
Author(s):  
L. Mulestagno ◽  
J.C. Holzer ◽  
P. Fraundorf
Keyword(s):  
Sample Preparation ◽  
Milling Time ◽  
High Density ◽  
Low Density ◽  
Ion Milling ◽  
High Quality ◽  
Variable Angle ◽  
Major Disadvantage ◽  
Induced Defects

Due to the wealth of information, both analytical and structural that can be obtained from it TEM always has been a favorite tool for the analysis of process-induced defects in semiconductor wafers. The only major disadvantage has always been, that the volume under study in the TEM is relatively small, making it difficult to locate low density defects, and sample preparation is a somewhat lengthy procedure. This problem has been somewhat alleviated by the availability of efficient low angle milling.Using a PIPS® variable angle ion -mill, manufactured by Gatan, we have been consistently obtaining planar specimens with a high quality thin area in excess of 5 × 104 μm2 in about half an hour (milling time), which has made it possible to locate defects at lower densities, or, for defects of relatively high density, obtain information which is statistically more significant (table 1).

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