Status report on the 500 MeV, high duty factor electron scattering facility under construction at Amsterdam

1979 ◽  
pp. 213-223
Author(s):  
C. de Vries
Keyword(s):  
Electron Scattering ◽  
Duty Factor ◽  
Status Report ◽  
Under Construction

Environmental Wet Cells for Biological Medium Voltage and High Voltage Microscopy

1973 ◽  
Vol 31 ◽  
pp. 14-15
Author(s):  
D. F. Parsons
Keyword(s):  
High Voltage ◽  
Electron Scattering ◽  
Analytical Tool ◽  
Full Potential ◽  
Scanning Microscope ◽  
Ordered Structures ◽  
Medium Voltage ◽  
Electron Microscopes ◽  
The Fourier Transform ◽  
Under Construction

In this laboratory a survey of the major types of ordered biological structures showed that most do not diffract in vacuum. This is the major reason that electron diffraction has not achieved its full potential as a major biological analytical tool. Also, the fine details of ordered structures can not be correctly imaged in the dry state since the image is the Fourier transform of the diffraction pattern. To overcome this limitation we have constructed both thin-window sealed, and aperture-limited hydration chambers both for medium voltage (100 KV) and high voltage (1.0 MV) electron microscopes. Another type of chamber is under construction for the scanning microscope. We find that differentially pumped, aperturelimited chambers show more promise than the film sealed chambers. Since this equipment can be used more continuously, the specimen can be more easily examined and there is less extraneous electron scattering.

Progress in the compilation of the FK5

1978 ◽  
Vol 48 ◽  
pp. 421-432 ◽  
Author(s):  
W. Fricke ◽  
W. Gliese
Keyword(s):  
Status Report ◽  
Magnitude Range

Abstract:Presented is a status report on work on FK5 giving information on the following items: (a) the intended increase of the number of fundamental stars and their magnitude range in FK5, (b) available material for the improvement of the system, (c) methods for the determination of systematic differences, (d) the determination of equator and equinox of FK5, and (e) the elimination of the motion of the FK4 equinox.

Study of charge transfer in FeTi

1983 ◽  
Vol 41 ◽  
pp. 296-297
Author(s):  
J. Taft∅
Keyword(s):  
Charge Transfer ◽  
Charge Distribution ◽  
Electron Scattering ◽  
Periodic System ◽  
Electron Distribution ◽  
Scattering Amplitude ◽  
Transition Elements ◽  
Hartree Fock ◽  
Cscl Structure ◽  
The Right

It is well known that for reflections corresponding to large interplanar spacings (i.e., sin θ/λ small), the electron scattering amplitude, f, is sensitive to the ionicity and to the charge distribution around the atoms. We have used this in order to obtain information about the charge distribution in FeTi, which is a candidate for storage of hydrogen. Our goal is to study the changes in electron distribution in the presence of hydrogen, and also the ionicity of hydrogen in metals, but so far our study has been limited to pure FeTi. FeTi has the CsCl structure and thus Fe and Ti scatter with a phase difference of π into the 100-ref lections. Because Fe (Z = 26) is higher in the periodic system than Ti (Z = 22), an immediate “guess” would be that Fe has a larger scattering amplitude than Ti. However, relativistic Hartree-Fock calculations show that the opposite is the case for the 100-reflection. An explanation for this may be sought in the stronger localization of the d-electrons of the first row transition elements when moving to the right in the periodic table. The tabulated difference between fTi (100) and ffe (100) is small, however, and based on the values of the scattering amplitude for isolated atoms, the kinematical intensity of the 100-reflection is only 5.10-4 of the intensity of the 200-reflection.

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Artefact in 20Å-Resolution Electron Images of Negatively Stained Twodimensional Membrane Protein Crystals

1982 ◽  
Vol 40 ◽  
pp. 92-93
Author(s):  
Douglas L. Dorset ◽  
Barbara Moss
Keyword(s):  
Electron Scattering ◽  
Cross Correlation ◽  
Transmission Function ◽  
Group Symmetry ◽  
Asymmetric Structure ◽  
Object Model ◽  
Phase Object ◽  
Computing Systems ◽  
Resolution Electron ◽  
Plane Group

A number of computing systems devoted to the averaging of electron images of two-dimensional macromolecular crystalline arrays have facilitated the visualization of negatively-stained biological structures. Either by simulation of optical filtering techniques or, in more refined treatments, by cross-correlation averaging, an idealized representation of the repeating asymmetric structure unit is constructed, eliminating image distortions due to radiation damage, stain irregularities and, in the latter approach, imperfections and distortions in the unit cell repeat. In these analyses it is generally assumed that the electron scattering from the thin negativelystained object is well-approximated by a phase object model. Even when absorption effects are considered (i.e. “amplitude contrast“), the expansion of the transmission function, q(x,y)=exp (iσɸ (x,y)), does not exceed the first (kinematical) term. Furthermore, in reconstruction of electron images, kinematical phases are applied to diffraction amplitudes and obey the constraints of the plane group symmetry.

Chemical modification of the bacterial wall to determine sites of metal deposition

1978 ◽  
Vol 36 (2) ◽  
pp. 350-351
Author(s):  
T. J. Beveridge
Keyword(s):  
Electron Scattering ◽  
Metal Salt ◽  
Metal Deposition ◽  
Suitable Model ◽  
X Ray Diffraction ◽  
Subtilis Cell ◽  
Thin Sections ◽  
X Ray ◽  
Section Data ◽  
Metal Impregnation

The Bacillus subtilis cell wall provides a protective sacculus about the vital constituents of the bacterium and consists of a collection of anionic hetero- and homopolymers which are mainly polysaccharidic. We recently demonstrated that unfixed walls were able to trap and retain substantial amounts of metal when suspended in aqueous metal salt solutions. These walls were briefly mixed with low concentration metal solutions (5mM for 10 min at 22°C), were well washed with deionized distilled water, and the quantity of metal uptake (atomic absorption and X-ray fluorescence), the type of staining response (electron scattering profile of thin-sections), and the crystallinity of the deposition product (X-ray diffraction of embedded specimens) determined.Since most biological material possesses little electron scattering ability electron microscopists have been forced to depend on heavy metal impregnation of the specimen before obtaining thin-section data. Our experience with these walls suggested that they may provide a suitable model system with which to study the sites of reaction for this metal deposition.

A Magnetic Spectrometer for a Scanning Transmission Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 436-437
Author(s):  
A. Kosiara ◽  
J. W. Wiggins ◽  
M. Beer
Keyword(s):  
Scanning Transmission Electron Microscope ◽  
Magnetic Spectrometer ◽  
Fringe Field ◽  
Curvature Radius ◽  
Magnetic Pole ◽  
Quadrupole Field ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
Under Construction ◽  
Image Position

A magnetic spectrometer to be attached to the Johns Hopkins S. T. E. M. is under construction. Its main purpose will be to investigate electron interactions with biological molecules in the energy range of 40 KeV to 100 KeV. The spectrometer is of the type described by Kerwin and by Crewe Its magnetic pole boundary is given by the equationwhere R is the electron curvature radius. In our case, R = 15 cm. The electron beam will be deflected by an angle of 90°. The distance between the electron source and the pole boundary will be 30 cm. A linear fringe field will be generated by a quadrupole field arrangement. This is accomplished by a grounded mirror plate and a 45° taper of the magnetic pole.

Radiation Damage Studies with the HVEM

1972 ◽  
Vol 30 ◽  
pp. 680-681
Author(s):  
J. J. Laidler ◽  
B. Mastel
Keyword(s):  
Radiation Damage ◽  
Stainless Steels ◽  
Volume Expansion ◽  
Austenitic Stainless Steels ◽  
Test Facility ◽  
Fast Breeder Reactors ◽  
Breeder Reactors ◽  
Under Construction ◽  
Development Laboratory ◽  
Insight Into

One of the major materials problems encountered in the development of fast breeder reactors for commercial power generation is the phenomenon of swelling in core structural components and fuel cladding. This volume expansion, which is due to the retention of lattice vacancies by agglomeration into large polyhedral clusters (voids), may amount to ten percent or greater at goal fluences in some austenitic stainless steels. From a design standpoint, this is an undesirable situation, and it is necessary to obtain experimental confirmation that such excessive volume expansion will not occur in materials selected for core applications in the Fast Flux Test Facility, the prototypic LMFBR now under construction at the Hanford Engineering Development Laboratory (HEDL). The HEDL JEM-1000 1 MeV electron microscope is being used to provide an insight into trends of radiation damage accumulation in stainless steels, since it is possible to produce atom displacements at an accelerated rate with 1 MeV electrons, while the specimen is under continuous observation.

Description of a New High Resolution Scanning Transmission EM

1972 ◽  
Vol 30 ◽  
pp. 418-419
Author(s):  
Michael Beer ◽  
J. W. Wiggins ◽  
David Woodruff ◽  
Jon Zubin
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Energy Dispersive Spectrometer ◽  
Scanning Transmission Electron Microscope ◽  
Objective Lens ◽  
Condenser Lens ◽  
Transmission Electron ◽  
Pattern Size ◽  
Scanning Transmission ◽  
Under Construction

A high resolution scanning transmission electron microscope of the type developed by A. V. Crewe is under construction in this laboratory. The basic design is completed and construction is under way with completion expected by the end of this year.The optical column of the microscope will consist of a field emission electron source, an accelerating lens, condenser lens, objective lens, diffraction lens, an energy dispersive spectrometer, and three electron detectors. For any accelerating voltage the condenser lens function to provide a parallel beam at the entrance of the objective lens. The diffraction lens is weak and its current will be controlled by the objective lens current to give an electron diffraction pattern size which is independent of small changes in the objective lens current made to achieve focus at the specimen. The objective lens demagnifies the image of the field emission source so that its Gaussian size is small compared to the aberration limit.

Mass Determination by Direct Measurement of Electron Scattering

1975 ◽  
Vol 33 ◽  
pp. 240-241
Author(s):  
M. K. Lamvik ◽  
A. V. Crewe
Keyword(s):  
Cross Section ◽  
Electron Scattering ◽  
Mass Density ◽  
Variable Mass ◽  
Scattering Cross Section ◽  
Mass Determination ◽  
Number Density ◽  
Cross Sectional ◽  
Thin Slice ◽  
Scattering Cross

If a molecule or atom of material has molecular weight A, the number density of such units is given by n=Nρ/A, where N is Avogadro's number and ρ is the mass density of the material. The amount of scattering from each unit can be written by assigning an imaginary cross-sectional area σ to each unit. If the current I0 is incident on a thin slice of material of thickness z and the current I remains unscattered, then the scattering cross-section σ is defined by I=IOnσz. For a specimen that is not thin, the definition must be applied to each imaginary thin slice and the result I/I0 =exp(-nσz) is obtained by integrating over the whole thickness. It is useful to separate the variable mass-thickness w=ρz from the other factors to yield I/I0 =exp(-sw), where s=Nσ/A is the scattering cross-section per unit mass.

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